Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition

Antti Säynätjoki (Corresponding Author), Lasse Karvonen, Tapani Alasaarela, X Tu, T. Y. Liow, Marianne Hiltunen, Ari Tervonen, G. Q. Lo, Seppo Honkanen

Research output: Contribution to journalArticleScientificpeer-review

52 Citations (Scopus)

Abstract

We demonstrate low-loss silicon slot waveguides patterned with 248 nm deep-UV lithography and filled with atomic layer deposited aluminum oxide. Propagation losses less than 5 dB/cm are achieved with the waveguides. The devices are fabricated using low-temperature CMOS compatible processes. We also demonstrate simple, compact and efficient strip-to-slot waveguide couplers. With a coupler as short as 10 µm, coupling loss is less than 0.15 dB. The low-index and low-nonlinearity filling material allows nonlinearities nearly two orders of magnitude smaller than in silicon waveguides. Therefore, these waveguides are a good candidate for linear photonic devices on the silicon platform, and for distortion-free signal transmission channels between different parts of a silicon all-optical chip. The low-nonlinearity slot waveguides and robust couplers also facilitate a 50-fold local change of the waveguide nonlinearity within the chip by a simple mask design.
Original languageEnglish
Pages (from-to)26275-26282
Number of pages8
JournalOptics Express
Volume19
Issue number27
DOIs
Publication statusPublished - 2011
MoE publication typeA1 Journal article-refereed

Fingerprint

atomic layer epitaxy
slots
couplers
lithography
waveguides
silicon
nonlinearity
chips
signal transmission
strip
CMOS
masks
platforms
aluminum oxides
photonics
propagation

Keywords

  • Integrated optics materials
  • Nonlinear
  • Nanostructure fabrication
  • Waveguides
  • Guided wave applications

Cite this

Säynätjoki, A., Karvonen, L., Alasaarela, T., Tu, X., Liow, T. Y., Hiltunen, M., ... Honkanen, S. (2011). Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition. Optics Express, 19(27), 26275-26282. https://doi.org/10.1364/OE.19.026275
Säynätjoki, Antti ; Karvonen, Lasse ; Alasaarela, Tapani ; Tu, X ; Liow, T. Y. ; Hiltunen, Marianne ; Tervonen, Ari ; Lo, G. Q. ; Honkanen, Seppo. / Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition. In: Optics Express. 2011 ; Vol. 19, No. 27. pp. 26275-26282.
@article{5e4b7624a14e454c9bfad91594ba23a9,
title = "Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition",
abstract = "We demonstrate low-loss silicon slot waveguides patterned with 248 nm deep-UV lithography and filled with atomic layer deposited aluminum oxide. Propagation losses less than 5 dB/cm are achieved with the waveguides. The devices are fabricated using low-temperature CMOS compatible processes. We also demonstrate simple, compact and efficient strip-to-slot waveguide couplers. With a coupler as short as 10 µm, coupling loss is less than 0.15 dB. The low-index and low-nonlinearity filling material allows nonlinearities nearly two orders of magnitude smaller than in silicon waveguides. Therefore, these waveguides are a good candidate for linear photonic devices on the silicon platform, and for distortion-free signal transmission channels between different parts of a silicon all-optical chip. The low-nonlinearity slot waveguides and robust couplers also facilitate a 50-fold local change of the waveguide nonlinearity within the chip by a simple mask design.",
keywords = "Integrated optics materials, Nonlinear, Nanostructure fabrication, Waveguides, Guided wave applications",
author = "Antti S{\"a}yn{\"a}tjoki and Lasse Karvonen and Tapani Alasaarela and X Tu and Liow, {T. Y.} and Marianne Hiltunen and Ari Tervonen and Lo, {G. Q.} and Seppo Honkanen",
note = "Project code: 72700",
year = "2011",
doi = "10.1364/OE.19.026275",
language = "English",
volume = "19",
pages = "26275--26282",
journal = "Optics Express",
issn = "1094-4087",
publisher = "Optical Society of America OSA",
number = "27",

}

Säynätjoki, A, Karvonen, L, Alasaarela, T, Tu, X, Liow, TY, Hiltunen, M, Tervonen, A, Lo, GQ & Honkanen, S 2011, 'Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition', Optics Express, vol. 19, no. 27, pp. 26275-26282. https://doi.org/10.1364/OE.19.026275

Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition. / Säynätjoki, Antti (Corresponding Author); Karvonen, Lasse; Alasaarela, Tapani; Tu, X; Liow, T. Y.; Hiltunen, Marianne; Tervonen, Ari; Lo, G. Q.; Honkanen, Seppo.

In: Optics Express, Vol. 19, No. 27, 2011, p. 26275-26282.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition

AU - Säynätjoki, Antti

AU - Karvonen, Lasse

AU - Alasaarela, Tapani

AU - Tu, X

AU - Liow, T. Y.

AU - Hiltunen, Marianne

AU - Tervonen, Ari

AU - Lo, G. Q.

AU - Honkanen, Seppo

N1 - Project code: 72700

PY - 2011

Y1 - 2011

N2 - We demonstrate low-loss silicon slot waveguides patterned with 248 nm deep-UV lithography and filled with atomic layer deposited aluminum oxide. Propagation losses less than 5 dB/cm are achieved with the waveguides. The devices are fabricated using low-temperature CMOS compatible processes. We also demonstrate simple, compact and efficient strip-to-slot waveguide couplers. With a coupler as short as 10 µm, coupling loss is less than 0.15 dB. The low-index and low-nonlinearity filling material allows nonlinearities nearly two orders of magnitude smaller than in silicon waveguides. Therefore, these waveguides are a good candidate for linear photonic devices on the silicon platform, and for distortion-free signal transmission channels between different parts of a silicon all-optical chip. The low-nonlinearity slot waveguides and robust couplers also facilitate a 50-fold local change of the waveguide nonlinearity within the chip by a simple mask design.

AB - We demonstrate low-loss silicon slot waveguides patterned with 248 nm deep-UV lithography and filled with atomic layer deposited aluminum oxide. Propagation losses less than 5 dB/cm are achieved with the waveguides. The devices are fabricated using low-temperature CMOS compatible processes. We also demonstrate simple, compact and efficient strip-to-slot waveguide couplers. With a coupler as short as 10 µm, coupling loss is less than 0.15 dB. The low-index and low-nonlinearity filling material allows nonlinearities nearly two orders of magnitude smaller than in silicon waveguides. Therefore, these waveguides are a good candidate for linear photonic devices on the silicon platform, and for distortion-free signal transmission channels between different parts of a silicon all-optical chip. The low-nonlinearity slot waveguides and robust couplers also facilitate a 50-fold local change of the waveguide nonlinearity within the chip by a simple mask design.

KW - Integrated optics materials

KW - Nonlinear

KW - Nanostructure fabrication

KW - Waveguides

KW - Guided wave applications

U2 - 10.1364/OE.19.026275

DO - 10.1364/OE.19.026275

M3 - Article

VL - 19

SP - 26275

EP - 26282

JO - Optics Express

JF - Optics Express

SN - 1094-4087

IS - 27

ER -