Low-nonlinearity and low-loss silicon slot waveguides with ALD-grown thin films

L. Karvonen, A. Säynätjoki, X. Tu, T.Y. Liow, Marianne Hiltunen, Jussi Hiltunen, A. Tervonen, G.Q. Lo, S. Honkanen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Abstract

    We demonstrate low-loss silicon slot waveguides filled with single and dual atomic layer deposited oxide layers. Propagation losses less than 5 dB/cm and 8 dB/cm are achieved for the waveguides with single (Al 2O 3) and double (Al 2O 3-TiO 2) layers, respectively. The devices are fabricated using low-temperature CMOS compatible processes. The geometries allow nonlinearities nearly two orders of magnitude smaller than plain silicon waveguides
    Original languageEnglish
    Title of host publicationProceedings of SPIE 8431
    Subtitle of host publicationSilicon Photonics and Photonic Integrated Circuits III
    EditorsVivien Laurent
    PublisherInternational Society for Optics and Photonics SPIE
    ISBN (Print)978-0-8194-9123-7
    DOIs
    Publication statusPublished - 2012
    MoE publication typeNot Eligible
    EventSilicon Photonics and Photonic Integrated Circuits III - Brussels, Belgium
    Duration: 16 Apr 201219 Apr 2012

    Publication series

    SeriesProceedings of SPIE
    Volume8431
    ISSN0277-786X

    Conference

    ConferenceSilicon Photonics and Photonic Integrated Circuits III
    CountryBelgium
    CityBrussels
    Period16/04/1219/04/12

    Keywords

    • Atomic layer deposition
    • loss
    • nonlinearity
    • slot waveguide

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