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In this study, a low temperature wafer-level packaging process aimed for encapsulating MEMS mirrors was developed. The glass cap wafer used in the package has an antireflective (AR) coating that limits the maximum temperature of the bonding process to 250°C. Copper thermocompression was used as copper has a high self-diffusivity and the native oxidation on copper surfaces can be completely removed with combination of ex situ acetic acid wet-etch and in situ forming gas anneal. Making it suitable for a development of a low temperature bonding process. In this work, bonding on of sputtered and electrodeposited copper films was studied on temperatures ranging from 200°C to 300°C as well as the effect of pretreatment on bond strength. The study presents a successful thermocompression bonding process for sputtered Cu films at a low temperature of 200°C with high yield of 97 % after dicing. The bond strength was recorded to be 75 MPa, well above the MIL-STD-883E standard (METHOD 2019.5) rejection limit of 6.08 MPa. The high dicing yield and bond strength suggest that the thermocompression bonding could be possible even at temperatures below 200°C. However, the minimum bonding temperature was not yet determined in this study.
|Title of host publication||2019 IMAPS Nordic Conference on Microelectronics Packaging, NORDPAC 2019|
|Publisher||IEEE Institute of Electrical and Electronic Engineers|
|Number of pages||5|
|Publication status||Published - 11 Jun 2019|
|MoE publication type||A4 Article in a conference publication|
|Event||IMAPS Nordic Annual Conference, NordPac 2019 - Technical University of Denmark, Lyngby, Denmark|
Duration: 11 Jun 2019 → 13 Jun 2019
|Conference||IMAPS Nordic Annual Conference, NordPac 2019|
|Period||11/06/19 → 13/06/19|
- wafer-level packaging
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- 1 Finished
PRYSTINE: Programmable Systems for Intelligence in Automobiles
Pensala, T., Ylivaara, O. M. E., Morits, D. & Kyynäräinen, J.
1/05/18 → 30/04/21
Project: EU project