Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide

Zhen Zhu (Corresponding Author), Perttu Sippola, Oili Ylivaara, Chiara Modanese, Marisa Di Sabatino, Kenichiro Mizohata, Saoussen Merdes, Harri Lipsanen, Hele Savin

    Research output: Contribution to journal › Article › Scientific › peer-review

    8 Citations (Scopus)

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    Engineering

    Material Science

    Chemical Engineering