Low-Temperature Processes for MEMS Device Fabrication

Jyrki Kiihamäki (Corresponding author), Hannu Kattelus, Martti Blomberg, Riikka Puurunen, Mari Laamanen, Panu Pekko, Jaakko Saarilahti, Heini Ritala, Anna Rissanen

    Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

    6 Citations (Scopus)

    Abstract

    The high temperatures typical in semiconductor and conventional MEMS fabrication limit the material choices in MEMS structures. This paper reviews some of the low-temperature processes and techniques available for MEMS fabrication and describes some characteristics of these techniques and practical process examples. The techniques described are plasma-enhanced chemical vapour deposition, atomic layer deposition, reactive sputtering, vapour phase hydrofluoric acid etching of low-temperature oxides, and low-temperature wafer bonding. As a practical example of the use of these techniques, the basic characteristics of a MEMS switch and other devices fabricated at VTT are presented.
    Original languageEnglish
    Title of host publicationAdvanced Materials and Technologies for Micro/Nano-Devices, Sensors and Actuators
    EditorsEvgeni Gusev, Eric Garfunkel, Arthur Dideikin
    PublisherSpringer
    Pages167-178
    ISBN (Electronic)978-90-481-3807-4
    ISBN (Print)978-90-481-3805-0
    DOIs
    Publication statusPublished - 2010
    MoE publication typeA3 Part of a book or another research book
    EventNATO Advanced Research Workshop on Advanced Materials and Technologies for Micro/Nano-Devices, Sensors and Actuators - St. Petersburg, Russian Federation
    Duration: 29 Jun 20092 Jul 2009

    Publication series

    SeriesNATO Science for Peace and Security Series B: Physics and Biophysics
    ISSN1874-6500

    Workshop

    WorkshopNATO Advanced Research Workshop on Advanced Materials and Technologies for Micro/Nano-Devices, Sensors and Actuators
    CountryRussian Federation
    CitySt. Petersburg
    Period29/06/092/07/09

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    Keywords

    • MEMS
    • thin film technology
    • fusion bonding
    • amorphous metals
    • HF-vapour etching

    Cite this

    Kiihamäki, J., Kattelus, H., Blomberg, M., Puurunen, R., Laamanen, M., Pekko, P., Saarilahti, J., Ritala, H., & Rissanen, A. (2010). Low-Temperature Processes for MEMS Device Fabrication. In E. Gusev, E. Garfunkel, & A. Dideikin (Eds.), Advanced Materials and Technologies for Micro/Nano-Devices, Sensors and Actuators (pp. 167-178). Springer. NATO Science for Peace and Security Series B: Physics and Biophysics https://doi.org/10.1007/978-90-481-3807-4_13