Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological AFM

V. Korpelainen; J. Seppä; A. Lassila

doi:10.1117/12.883818

Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological AFM

BA1702 Length metrology

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

1 Citation (Scopus)

Abstract

Gratings and step height standards are useful transfer standards for lateral and vertical length scale calibration of AFMs. In order to have traceability to the SI-metre, the standards must have been calibrated prior to use. Metrological AFMs (MAFMs) with online laser interferometric position measurements are versatile instruments for the calibrations. The developed task specific measurement strategies for step height and pitch calibrations with MIKES metrological AFM are described. The strategies were developed to give high accuracy and to reduce the measurement time. Detailed uncertainty estimations for step height and grating pitch calibrations are also given.

Original language	English
Title of host publication	Proceedings of SPIE, Scanning Microscopies 2011
Subtitle of host publication	Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
Publisher	International Society for Optics and Photonics SPIE
ISBN (Print)	978-0-8194-8610-3
DOIs	https://doi.org/10.1117/12.883818
Publication status	Published - 2011
MoE publication type	A4 Article in a conference publication
Event	Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences - Orlando, FL, United States Duration: 26 Apr 2011 → 28 Apr 2011

Publication series

Series	Proceedings of SPIE
Volume	8036
ISSN	0277-786X

Conference

Conference	Scanning Microscopies 2011
Country	United States
City	Orlando, FL
Period	26/04/11 → 28/04/11

Keywords

Atomic force microscope (AFM)
Calibration
Grating pitch
Step height
Uncertainty

Access to Document

10.1117/12.883818

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Korpelainen, V., Seppä, J., & Lassila, A. (2011). Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological AFM. In Proceedings of SPIE, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences [80360Q] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 8036 https://doi.org/10.1117/12.883818

Korpelainen, V. ; Seppä, J. ; Lassila, A. / Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological AFM. Proceedings of SPIE, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences. International Society for Optics and Photonics SPIE, 2011. (Proceedings of SPIE, Vol. 8036).

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abstract = "Gratings and step height standards are useful transfer standards for lateral and vertical length scale calibration of AFMs. In order to have traceability to the SI-metre, the standards must have been calibrated prior to use. Metrological AFMs (MAFMs) with online laser interferometric position measurements are versatile instruments for the calibrations. The developed task specific measurement strategies for step height and pitch calibrations with MIKES metrological AFM are described. The strategies were developed to give high accuracy and to reduce the measurement time. Detailed uncertainty estimations for step height and grating pitch calibrations are also given.",

keywords = "Atomic force microscope (AFM), Calibration, Grating pitch, Step height, Uncertainty",

author = "V. Korpelainen and J. Sepp{\"a} and A. Lassila",

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note = "Scanning Microscopies 2011 : Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences ; Conference date: 26-04-2011 Through 28-04-2011",

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Korpelainen, V , Seppä, J & Lassila, A 2011, Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological AFM. in Proceedings of SPIE, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences., 80360Q, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 8036, Scanning Microscopies 2011, Orlando, FL, United States, 26/04/11. https://doi.org/10.1117/12.883818

Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological AFM. / Korpelainen, V.; Seppä, J.; Lassila, A.

Proceedings of SPIE, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences. International Society for Optics and Photonics SPIE, 2011. 80360Q (Proceedings of SPIE, Vol. 8036).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

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AB - Gratings and step height standards are useful transfer standards for lateral and vertical length scale calibration of AFMs. In order to have traceability to the SI-metre, the standards must have been calibrated prior to use. Metrological AFMs (MAFMs) with online laser interferometric position measurements are versatile instruments for the calibrations. The developed task specific measurement strategies for step height and pitch calibrations with MIKES metrological AFM are described. The strategies were developed to give high accuracy and to reduce the measurement time. Detailed uncertainty estimations for step height and grating pitch calibrations are also given.

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KW - Calibration

KW - Grating pitch

KW - Step height

KW - Uncertainty

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Korpelainen V , Seppä J , Lassila A. Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological AFM. In Proceedings of SPIE, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences. International Society for Optics and Photonics SPIE. 2011. 80360Q. (Proceedings of SPIE, Vol. 8036). https://doi.org/10.1117/12.883818