Abstract
The residual layer inherent for nanoimprinting is usually
taken to be a problem in the process. We exploit the
residual layer in fabrication of the complex
free-standing membranes by growing a layer of Al2O3 or
Al2O3/TiO2 lamellae by ALD directly on top of the
nanoimprinted polymer film, following by removal of the
sacrificial polymer layer.
Original language | English |
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Publication status | Published - 2013 |
MoE publication type | Not Eligible |
Event | 12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013 - Barcelona, Spain Duration: 21 Oct 2013 → 23 Oct 2013 Conference number: 12 |
Conference
Conference | 12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013 |
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Abbreviated title | NNT 2013 |
Country/Territory | Spain |
City | Barcelona |
Period | 21/10/13 → 23/10/13 |
Keywords
- ALD
- NIL
- nanoimprinting
- SSIL
- step and stamp
- step&repeat