Membranes and tubules by nanoimprinting and atomic layer deposition

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    Abstract

    The residual layer inherent for nanoimprinting is usually taken to be a problem in the process. We exploit the residual layer in fabrication of the complex free-standing membranes by growing a layer of Al2O3 or Al2O3/TiO2 lamellae by ALD directly on top of the nanoimprinted polymer film, following by removal of the sacrificial polymer layer.
    Original languageEnglish
    Publication statusPublished - 2013
    MoE publication typeNot Eligible
    Event12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013 - Barcelona, Spain
    Duration: 21 Oct 201323 Oct 2013
    Conference number: 12

    Conference

    Conference12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013
    Abbreviated titleNNT 2013
    CountrySpain
    CityBarcelona
    Period21/10/1323/10/13

    Fingerprint

    atomic layer epitaxy
    membranes
    polymers
    lamella
    fabrication

    Keywords

    • ALD
    • NIL
    • nanoimprinting
    • SSIL
    • step and stamp
    • step&repeat

    Cite this

    Haatainen, T., Kainlauri, M., Arpiainen, S., Markkanen, M., Marles, J., Puurunen, R., & Ahopelto, J. (2013). Membranes and tubules by nanoimprinting and atomic layer deposition. Abstract from 12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013, Barcelona, Spain.
    Haatainen, Tomi ; Kainlauri, Markku ; Arpiainen, Sanna ; Markkanen, Merja ; Marles, Jaana ; Puurunen, Riikka ; Ahopelto, Jouni. / Membranes and tubules by nanoimprinting and atomic layer deposition. Abstract from 12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013, Barcelona, Spain.
    @conference{09edefbfb3984758a54d1b3518f274a4,
    title = "Membranes and tubules by nanoimprinting and atomic layer deposition",
    abstract = "The residual layer inherent for nanoimprinting is usually taken to be a problem in the process. We exploit the residual layer in fabrication of the complex free-standing membranes by growing a layer of Al2O3 or Al2O3/TiO2 lamellae by ALD directly on top of the nanoimprinted polymer film, following by removal of the sacrificial polymer layer.",
    keywords = "ALD, NIL, nanoimprinting, SSIL, step and stamp, step&repeat",
    author = "Tomi Haatainen and Markku Kainlauri and Sanna Arpiainen and Merja Markkanen and Jaana Marles and Riikka Puurunen and Jouni Ahopelto",
    year = "2013",
    language = "English",
    note = "12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013, NNT 2013 ; Conference date: 21-10-2013 Through 23-10-2013",

    }

    Haatainen, T, Kainlauri, M, Arpiainen, S, Markkanen, M, Marles, J, Puurunen, R & Ahopelto, J 2013, 'Membranes and tubules by nanoimprinting and atomic layer deposition', 12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013, Barcelona, Spain, 21/10/13 - 23/10/13.

    Membranes and tubules by nanoimprinting and atomic layer deposition. / Haatainen, Tomi; Kainlauri, Markku; Arpiainen, Sanna; Markkanen, Merja; Marles, Jaana; Puurunen, Riikka; Ahopelto, Jouni.

    2013. Abstract from 12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013, Barcelona, Spain.

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    TY - CONF

    T1 - Membranes and tubules by nanoimprinting and atomic layer deposition

    AU - Haatainen, Tomi

    AU - Kainlauri, Markku

    AU - Arpiainen, Sanna

    AU - Markkanen, Merja

    AU - Marles, Jaana

    AU - Puurunen, Riikka

    AU - Ahopelto, Jouni

    PY - 2013

    Y1 - 2013

    N2 - The residual layer inherent for nanoimprinting is usually taken to be a problem in the process. We exploit the residual layer in fabrication of the complex free-standing membranes by growing a layer of Al2O3 or Al2O3/TiO2 lamellae by ALD directly on top of the nanoimprinted polymer film, following by removal of the sacrificial polymer layer.

    AB - The residual layer inherent for nanoimprinting is usually taken to be a problem in the process. We exploit the residual layer in fabrication of the complex free-standing membranes by growing a layer of Al2O3 or Al2O3/TiO2 lamellae by ALD directly on top of the nanoimprinted polymer film, following by removal of the sacrificial polymer layer.

    KW - ALD

    KW - NIL

    KW - nanoimprinting

    KW - SSIL

    KW - step and stamp

    KW - step&repeat

    M3 - Conference Abstract

    ER -

    Haatainen T, Kainlauri M, Arpiainen S, Markkanen M, Marles J, Puurunen R et al. Membranes and tubules by nanoimprinting and atomic layer deposition. 2013. Abstract from 12th International Conference on Nanoimprint & Nanoprint Technology, NNT 2013, Barcelona, Spain.