Metal fluoride thin films deposited by atomic layer epitaxy

Markku Ylilammi, Timo Ranta-aho

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Original languageEnglish
Title of host publication9th International Conference on Thin Films, ICTF9
Subtitle of host publicationBook of Abstracts
Place of PublicationWien
Publication statusPublished - 1993
MoE publication typeNot Eligible
Event9th International Conference on Thin Films, ICTF9 - Wien, Austria
Duration: 6 Sep 199310 Sep 1993

Conference

Conference9th International Conference on Thin Films, ICTF9
CountryAustria
CityWien
Period6/09/9310/09/93

Cite this

Ylilammi, M., & Ranta-aho, T. (1993). Metal fluoride thin films deposited by atomic layer epitaxy. In 9th International Conference on Thin Films, ICTF9: Book of Abstracts