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Metal fluoride thin films prepared by atomic layer deposition
Markku Ylilammi
, Timo Ranta-aho
Research output
:
Contribution to journal
›
Article
›
Scientific
›
peer-review
70
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INIS
layers
100%
metals
100%
thin films
100%
deposition
100%
fluorides
100%
growth
50%
films
50%
density
25%
substrates
25%
acetates
25%
electrical properties
25%
optical properties
25%
atmospheres
25%
nitrogen
25%
zinc
25%
orientation
25%
glass
25%
stoichiometry
25%
hydrates
25%
zinc sulfides
25%
calcium fluorides
25%
index of refraction
25%
hydrogen fluorides
25%
Keyphrases
Atomic Layer Deposition
100%
Metal Fluoride
100%
Growth Properties
33%
Electrical Properties
33%
Optical Properties
33%
Nitrogen Atmosphere
33%
Growth Rate
33%
Multilayer Structure
33%
Crystallinity
33%
Stoichiometry
33%
Density Property
33%
Fluoride
33%
Source Material
33%
Glass Substrate
33%
Fluorite
33%
Index of Refraction
33%
Strontium Fluoride
33%
Hydrogen Fluoride
33%
Zinc Acetate
33%
Atomic Density
33%
Zinc Fluoride
33%
Alkaline Earth
33%
Diketonates
33%
Material Science
Film
100%
Thin Films
100%
Density
50%
Optical Property
50%