Metal fluoride thin films prepared by atomic layer deposition

Chemistry

• Atomic Layer Epitaxy 100%
• Fluoride 66%
• Alkaline Earth Metal 66%
• Liquid Film 66%
• Reaction Temperature 66%
• Nitrogen 33%
• Optical Property 33%
• Reaction Stoichiometry 33%
• Crystallinity 33%
• Electrical Property 33%
• Glass Substrate 33%
• Hydrogen Fluoride 33%
• Calcium Fluoride 33%
• Refraction 33%
• Zinc Acetate 33%
• Metal 33%
• Density 33%

Physics

• Atomic Layer Epitaxy 100%
• Thin Films 66%
• Temperature 66%
• Nitrogen 33%
• Electrical Properties 33%
• Crystallinity 33%
• Optical Properties 33%
• Stoichiometry 33%
• Refraction 33%
• Metal 33%
• Growth 33%
• Growth Rate 33%
• Cycles 33%

Material Science

• Material 100%
• Thin Films 66%
• Liquid Films 66%
• Growth Rate 33%
• Protective Atmosphere 33%