Method and apparatus for pressurizing gas

Kristian Melin; Marjut Suomalainen; Pekka Simell; Esa Kurkela

Method and apparatus for pressurizing gas

Kristian Melin (Inventor), Marjut Suomalainen (Inventor), Pekka Simell (Inventor), Esa Kurkela (Inventor)

Research output: Patent › Patent

Abstract

The invention relates to a method and an apparatus for pressurizing gas, wherein a gas (1) is treated in a multistage treatment comprising at least two ejector stages (3,9), a motive medium (2) which comprises liquid or steam at high pressure is injected to at least one ejector of the ejector stage (3), and the gas (1) is sucked into the same ejector in which the gas is mixed with the motive medium for forming a mixture (4), at least a part of the gas phase (6) is separated from the mixture (4) and is supplied to a next ejector stage (9) which comprises at least one ejector so that a second or later motive medium (8) which comprises liquid or steam at high pressure is injected to the ejector and the gas phase (6) is sucked into the same ejector in which the gas phase is mixed with the motive medium for forming a second or later mixture (10), and the gas is compressed by the motive medium (2,8) in the ejectors so that pressure of the gas is increased to a first pressure level in the first ejector stage (3) and pressure of the gas is increased from the previous pressure level to a second or later pressure level in the second or later ejector stage (9). Further, the invention relates to the use.

Patent family as of 30.12.2022

BR112019023517 A220200519BR2019112351720180509
CA3062730 AA20191107CA2018306273020180509
CN110740801 A20200131CN20188003757420180509
EP3634606 A120200415EP2018072620520180509
FI129944 B20221115FI2017000541420170509
FI20175414 A20181110FI2017000541420170509
US2020078730 AA20200312US2018061015720180509
WO18206850 A120181115WO2018FI5035020180509

Link to current patent family on right

Original language	English
Patent number	FI129944
IPC	F04F 5/ 54 A I
Priority date	9/05/17
Publication status	Published - 10 Nov 2018
MoE publication type	H1 Granted patent

Cite this

@misc{c9c2ab54f54a45b78fd575cb440d1254,

title = "Method and apparatus for pressurizing gas",

abstract = "The invention relates to a method and an apparatus for pressurizing gas, wherein a gas (1) is treated in a multistage treatment comprising at least two ejector stages (3,9), a motive medium (2) which comprises liquid or steam at high pressure is injected to at least one ejector of the ejector stage (3), and the gas (1) is sucked into the same ejector in which the gas is mixed with the motive medium for forming a mixture (4), at least a part of the gas phase (6) is separated from the mixture (4) and is supplied to a next ejector stage (9) which comprises at least one ejector so that a second or later motive medium (8) which comprises liquid or steam at high pressure is injected to the ejector and the gas phase (6) is sucked into the same ejector in which the gas phase is mixed with the motive medium for forming a second or later mixture (10), and the gas is compressed by the motive medium (2,8) in the ejectors so that pressure of the gas is increased to a first pressure level in the first ejector stage (3) and pressure of the gas is increased from the previous pressure level to a second or later pressure level in the second or later ejector stage (9). Further, the invention relates to the use.Patent family as of 30.12.2022BR112019023517 A220200519BR2019112351720180509 CA3062730 AA20191107CA2018306273020180509 CN110740801 A20200131CN20188003757420180509 EP3634606 A120200415EP2018072620520180509 FI129944 B20221115FI2017000541420170509 FI20175414 A20181110FI2017000541420170509 US2020078730 AA20200312US2018061015720180509 WO18206850 A120181115WO2018FI5035020180509Link to current patent family on right ",

author = "Kristian Melin and Marjut Suomalainen and Pekka Simell and Esa Kurkela",

year = "2018",

month = nov,

day = "10",

language = "English",

type = "Patent",

note = "FI129944; F04F 5/ 54 A I",

}

TY - PAT

T1 - Method and apparatus for pressurizing gas

AU - Melin, Kristian

AU - Suomalainen, Marjut

AU - Simell, Pekka

AU - Kurkela, Esa

PY - 2018/11/10

Y1 - 2018/11/10

N2 - The invention relates to a method and an apparatus for pressurizing gas, wherein a gas (1) is treated in a multistage treatment comprising at least two ejector stages (3,9), a motive medium (2) which comprises liquid or steam at high pressure is injected to at least one ejector of the ejector stage (3), and the gas (1) is sucked into the same ejector in which the gas is mixed with the motive medium for forming a mixture (4), at least a part of the gas phase (6) is separated from the mixture (4) and is supplied to a next ejector stage (9) which comprises at least one ejector so that a second or later motive medium (8) which comprises liquid or steam at high pressure is injected to the ejector and the gas phase (6) is sucked into the same ejector in which the gas phase is mixed with the motive medium for forming a second or later mixture (10), and the gas is compressed by the motive medium (2,8) in the ejectors so that pressure of the gas is increased to a first pressure level in the first ejector stage (3) and pressure of the gas is increased from the previous pressure level to a second or later pressure level in the second or later ejector stage (9). Further, the invention relates to the use.Patent family as of 30.12.2022BR112019023517 A220200519BR2019112351720180509 CA3062730 AA20191107CA2018306273020180509 CN110740801 A20200131CN20188003757420180509 EP3634606 A120200415EP2018072620520180509 FI129944 B20221115FI2017000541420170509 FI20175414 A20181110FI2017000541420170509 US2020078730 AA20200312US2018061015720180509 WO18206850 A120181115WO2018FI5035020180509Link to current patent family on right

AB - The invention relates to a method and an apparatus for pressurizing gas, wherein a gas (1) is treated in a multistage treatment comprising at least two ejector stages (3,9), a motive medium (2) which comprises liquid or steam at high pressure is injected to at least one ejector of the ejector stage (3), and the gas (1) is sucked into the same ejector in which the gas is mixed with the motive medium for forming a mixture (4), at least a part of the gas phase (6) is separated from the mixture (4) and is supplied to a next ejector stage (9) which comprises at least one ejector so that a second or later motive medium (8) which comprises liquid or steam at high pressure is injected to the ejector and the gas phase (6) is sucked into the same ejector in which the gas phase is mixed with the motive medium for forming a second or later mixture (10), and the gas is compressed by the motive medium (2,8) in the ejectors so that pressure of the gas is increased to a first pressure level in the first ejector stage (3) and pressure of the gas is increased from the previous pressure level to a second or later pressure level in the second or later ejector stage (9). Further, the invention relates to the use.Patent family as of 30.12.2022BR112019023517 A220200519BR2019112351720180509 CA3062730 AA20191107CA2018306273020180509 CN110740801 A20200131CN20188003757420180509 EP3634606 A120200415EP2018072620520180509 FI129944 B20221115FI2017000541420170509 FI20175414 A20181110FI2017000541420170509 US2020078730 AA20200312US2018061015720180509 WO18206850 A120181115WO2018FI5035020180509Link to current patent family on right

UR - https://worldwide.espacenet.com/patent/search/family/062218006/publication/FI129944B?q=FI129944

M3 - Patent

M1 - FI129944

ER -

Method and apparatus for pressurizing gas

Abstract

Other files and links

Fingerprint

Cite this