The invention relates to a method and an apparatus for pressurizing gas, wherein a gas (1) is treated in a multistage treatment comprising at least two ejector stages (3,9), a motive medium (2) which comprises liquid or steam at high pressure is injected to at least one ejector of the ejector stage (3), and the gas (1) is sucked into the same ejector in which the gas is mixed with the motive medium for forming a mixture (4), at least a part of the gas phase (6) is separated from the mixture (4) and is supplied to a next ejector stage (9) which comprises at least one ejector so that a second or later motive medium (8) which comprises liquid or steam at high pressure is injected to the ejector and the gas phase (6) is sucked into the same ejector in which the gas phase is mixed with the motive medium for forming a second or later mixture (10), and the gas is compressed by the motive medium (2,8) in the ejectors so that pressure of the gas is increased to a first pressure level in the first ejector stage (3) and pressure of the gas is increased from the previous pressure level to a second or later pressure level in the second or later ejector stage (9). Further, the invention relates to the use.
Patent family as of 30.12.2022BR112019023517 A220200519BR2019112351720180509
Link to current patent family on right
|IPC||F04F 5/ 54 A I|
|Publication status||Published - 10 Nov 2018|
|MoE publication type||H1 Granted patent|