Method for characterization of Si waveguide propagation loss.

Michele Moresco, Marco Romagnoli, Stefano Boscolo, Michele Midrio, Matteo Cherchi, Ehsan Shah Hosseini, Douglas Coolbaugh, Michael R Watts, Birendra Dutt

Research output: Contribution to journalArticleScientificpeer-review

16 Citations (Scopus)

Abstract

A new method for measuring waveguide propagation loss in silicon nanowires is presented. This method, based on the interplay between traveling ring modes and standing wave modes due to back-scattering from edge roughness, is accurate and can be used for on wafer measurement of test structures. Examples of loss measurements and fitting are reported.
Original languageEnglish
Pages (from-to)5391-400
JournalOptics Express
Volume21
Issue number5
DOIs
Publication statusPublished - 2013
MoE publication typeA1 Journal article-refereed

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