Method for characterization of Si waveguide propagation loss.

Michele Moresco, Marco Romagnoli, Stefano Boscolo, Michele Midrio, Matteo Cherchi, Ehsan Shah Hosseini, Douglas Coolbaugh, Michael R Watts, Birendra Dutt

Research output: Contribution to journalArticleScientificpeer-review

13 Citations (Scopus)

Abstract

A new method for measuring waveguide propagation loss in silicon nanowires is presented. This method, based on the interplay between traveling ring modes and standing wave modes due to back-scattering from edge roughness, is accurate and can be used for on wafer measurement of test structures. Examples of loss measurements and fitting are reported.
Original languageEnglish
Pages (from-to)5391-400
JournalOptics Express
Volume21
Issue number5
DOIs
Publication statusPublished - 2013
MoE publication typeA1 Journal article-refereed

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waveguides
propagation
modes (standing waves)
nanowires
roughness
wafers
rings
silicon
scattering

Cite this

Moresco, M., Romagnoli, M., Boscolo, S., Midrio, M., Cherchi, M., Hosseini, E. S., ... Dutt, B. (2013). Method for characterization of Si waveguide propagation loss. Optics Express, 21(5), 5391-400. https://doi.org/10.1364/OE.21.005391
Moresco, Michele ; Romagnoli, Marco ; Boscolo, Stefano ; Midrio, Michele ; Cherchi, Matteo ; Hosseini, Ehsan Shah ; Coolbaugh, Douglas ; Watts, Michael R ; Dutt, Birendra. / Method for characterization of Si waveguide propagation loss. In: Optics Express. 2013 ; Vol. 21, No. 5. pp. 5391-400.
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Moresco, M, Romagnoli, M, Boscolo, S, Midrio, M, Cherchi, M, Hosseini, ES, Coolbaugh, D, Watts, MR & Dutt, B 2013, 'Method for characterization of Si waveguide propagation loss.', Optics Express, vol. 21, no. 5, pp. 5391-400. https://doi.org/10.1364/OE.21.005391

Method for characterization of Si waveguide propagation loss. / Moresco, Michele; Romagnoli, Marco; Boscolo, Stefano; Midrio, Michele; Cherchi, Matteo; Hosseini, Ehsan Shah; Coolbaugh, Douglas; Watts, Michael R; Dutt, Birendra.

In: Optics Express, Vol. 21, No. 5, 2013, p. 5391-400.

Research output: Contribution to journalArticleScientificpeer-review

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T1 - Method for characterization of Si waveguide propagation loss.

AU - Moresco, Michele

AU - Romagnoli, Marco

AU - Boscolo, Stefano

AU - Midrio, Michele

AU - Cherchi, Matteo

AU - Hosseini, Ehsan Shah

AU - Coolbaugh, Douglas

AU - Watts, Michael R

AU - Dutt, Birendra

PY - 2013

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AB - A new method for measuring waveguide propagation loss in silicon nanowires is presented. This method, based on the interplay between traveling ring modes and standing wave modes due to back-scattering from edge roughness, is accurate and can be used for on wafer measurement of test structures. Examples of loss measurements and fitting are reported.

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DO - 10.1364/OE.21.005391

M3 - Article

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JO - Optics Express

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Moresco M, Romagnoli M, Boscolo S, Midrio M, Cherchi M, Hosseini ES et al. Method for characterization of Si waveguide propagation loss. Optics Express. 2013;21(5):5391-400. https://doi.org/10.1364/OE.21.005391