Abstract
A layered structure (104) of the micro-electromechanical system apparatus comprises a sacrificial layer (106) between a first layer arrangement (108') and a second layer arrangement (110') of the layered structure (104). The sacrificial layer (106) comprises a trench (100) with a shape of a trench pattern (100'). The trench (100) extends through the sacrificial layer (106), and the trench pattern (106') defines a boundary to at least one cavity area (120) of micro-electromechanical system apparatus. The first layer element (108') comprises at least one hole (124) through the first layer arrangement (108') of the layered structure (104) and/or the second layer element (110') comprises an opening (700) through a second layer arrangement (110'). The first layer arrangement (108') and the second layer arrangement (110') are in contact with the sacrificial layer (106). The at least one hole (124) is smaller than the cavity area (120) which the at least one hole (124) is associated with, and the opening (700) is equal to or smaller than the cavity area (120) which the opening (700) is associated with. Each of the cavity area (120) includes a cavity (120') between the first layer arrangement (108') and the second layer arrangement (110'), the cavity (120') being laterally limited by a barrier structure (116) wall arrangement (116') of the trench (100).
| Original language | English |
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| Patent number | WO2025242969A1 |
| IPC | B81C1/00 |
| Priority date | 23/05/24 |
| Filing date | 22/05/25 |
| Publication status | Published - 27 Nov 2025 |
| MoE publication type | H1 Granted patent |