Abstract
| Original language | English |
|---|---|
| Title of host publication | Proceedings |
| Subtitle of host publication | 9th Euro-American Workshop on Information Optics, WIO 2010 |
| Place of Publication | Piscataway, NJ, USA |
| Publisher | IEEE Institute of Electrical and Electronic Engineers |
| Number of pages | 4 |
| ISBN (Electronic) | 978-1-4244-8227-6 |
| ISBN (Print) | 978-1-4244-8226-9 |
| DOIs | |
| Publication status | Published - 2010 |
| MoE publication type | A4 Article in a conference publication |
| Event | 9th Euro-American Workshop on Information Optics, WIO 2010 - Helsinki, Finland Duration: 12 Jul 2010 → 16 Jul 2010 |
Conference
| Conference | 9th Euro-American Workshop on Information Optics, WIO 2010 |
|---|---|
| Abbreviated title | WIO 2010 |
| Country | Finland |
| City | Helsinki |
| Period | 12/07/10 → 16/07/10 |
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Miniaturized spectrometer technologies. / Antila, Jarkko.
Proceedings: 9th Euro-American Workshop on Information Optics, WIO 2010. Piscataway, NJ, USA : IEEE Institute of Electrical and Electronic Engineers , 2010.Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review
TY - GEN
T1 - Miniaturized spectrometer technologies
AU - Antila, Jarkko
PY - 2010
Y1 - 2010
N2 - VTT has developed new MEMS based spectrometer technologies to meet various spectral sensing demands from UV to thermal IR. New inventions have been made to cover wavelength ranges from 350 nm up to 14 µm and to enlarge apertures of devices for increased throughput. This paper reviews VTT's surface micromachined Fabry-Perot interferometer technologies, highlights their key parameters and describes the related instrumentation. (13 refs.)
AB - VTT has developed new MEMS based spectrometer technologies to meet various spectral sensing demands from UV to thermal IR. New inventions have been made to cover wavelength ranges from 350 nm up to 14 µm and to enlarge apertures of devices for increased throughput. This paper reviews VTT's surface micromachined Fabry-Perot interferometer technologies, highlights their key parameters and describes the related instrumentation. (13 refs.)
U2 - 10.1109/WIO.2010.5582486
DO - 10.1109/WIO.2010.5582486
M3 - Conference article in proceedings
SN - 978-1-4244-8226-9
BT - Proceedings
PB - IEEE Institute of Electrical and Electronic Engineers
CY - Piscataway, NJ, USA
ER -