Abstract
A method for producing a mirror plate for a Fabry-Perot interferometer includes
providing a substrate, which includes silicon,
implementing a semi-transparent reflective coating on the substrate,
forming a passivated region in and/or on the substrate by etching a plurality of voids in the substrate, and by passivating the surfaces of the voids,
forming a first sensor electrode on top of the passivated region, and
forming a second sensor electrode supported by the substrate.
Patent family as of 8.12.2021
CN107430032 A 20171201 CN201680014528 20160308
CN107430032 B 20190416 CN201680014528 20160308
DE602016035143 D1 20200520 DE201660035143T 20160308
EP3268708 A1 20180117 EP20160761146 20160308
EP3268708 A4 20180829 EP20160761146 20160308
EP3268708 B1 20200429 EP20160761146 20160308
FI127159 B 20171215 FI20150005151 20150309
FI20155151 A 20160910 FI20150005151 20150309
JP2018511822 T2 20180426 JP20170547156T 20160308
JP6730300 B2 20200729 JP20170547156T 20160308
US10495514 BB 20191203 US20160556662 20160308
US2018052049 AA 20180222 US20160556662 20160308
WO16142583 A1 20160915 WO2016FI50139 20160308
providing a substrate, which includes silicon,
implementing a semi-transparent reflective coating on the substrate,
forming a passivated region in and/or on the substrate by etching a plurality of voids in the substrate, and by passivating the surfaces of the voids,
forming a first sensor electrode on top of the passivated region, and
forming a second sensor electrode supported by the substrate.
Patent family as of 8.12.2021
CN107430032 A 20171201 CN201680014528 20160308
CN107430032 B 20190416 CN201680014528 20160308
DE602016035143 D1 20200520 DE201660035143T 20160308
EP3268708 A1 20180117 EP20160761146 20160308
EP3268708 A4 20180829 EP20160761146 20160308
EP3268708 B1 20200429 EP20160761146 20160308
FI127159 B 20171215 FI20150005151 20150309
FI20155151 A 20160910 FI20150005151 20150309
JP2018511822 T2 20180426 JP20170547156T 20160308
JP6730300 B2 20200729 JP20170547156T 20160308
US10495514 BB 20191203 US20160556662 20160308
US2018052049 AA 20180222 US20160556662 20160308
WO16142583 A1 20160915 WO2016FI50139 20160308
Link to currentpatent family on right
Original language | English |
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Patent number | EP3268708 |
IPC | G02B 26/ 00 A I |
Priority date | 8/03/16 |
Publication status | Published - 17 Jan 2018 |
MoE publication type | H1 Granted patent |