Mix and Match of NIL with UV-Lithography

H.C. Scheer, H. Schulz, M. Wissen, K. Pfeiffer, F. Reuther, G. Grueztner, L. Montelius, B. Heidari, J. Ahopelto, Tomi Haatainen, Ch. Cardinaud, F. Gaboriau

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publicationProceeding of the First International Conference on Nanoimprint Nanoprint Technology
    Place of PublicationSan Francisco
    PublisherNaval Research Laboratory
    Pages22-23
    Publication statusPublished - 2002
    MoE publication typeNot Eligible
    Event1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 - San Francisco, United States
    Duration: 11 Dec 200213 Dec 2002
    http://www.nntconf.org/pdf/2002ProgramSchedule.pdf (Conference Programme)

    Conference

    Conference1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02
    Abbreviated titleNNT 2002
    CountryUnited States
    CitySan Francisco
    Period11/12/0213/12/02
    Internet address

    Keywords

    • Nanoimprint Lithography

    Cite this

    Scheer, H. C., Schulz, H., Wissen, M., Pfeiffer, K., Reuther, F., Grueztner, G., Montelius, L., Heidari, B., Ahopelto, J., Haatainen, T., Cardinaud, C., & Gaboriau, F. (2002). Mix and Match of NIL with UV-Lithography. In Proceeding of the First International Conference on Nanoimprint Nanoprint Technology (pp. 22-23). Naval Research Laboratory.