Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

Markku Ylilammi (Corresponding Author), Oili M.E. Ylivaara, Riikka L. Puurunen

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)

Abstract

The conformality of thin films grown by atomic layer deposition (ALD) is studied using all-silicon test structures with long narrow lateral channels. A diffusion model, developed in this work, is used for studying the propagation of ALD growth in narrow channels. The diffusion model takes into account the gas transportation at low pressures, the dynamic Langmuir adsorption model for the film growth and the effect of channel narrowing due to film growth. The film growth is calculated by solving the diffusion equation with surface reactions. An efficient analytic approximate solution of the diffusion equation is developed for fitting the model to the measured thickness profile. The fitting gives the equilibrium constant of adsorption and the sticking coefficient. This model and Gordon's plug flow model are compared. The simulations predict the experimental measurement results quite well for Al2O3 and TiO2 ALD processes.

Original languageEnglish
Article number205301
JournalJournal of Applied Physics
Volume123
Issue number20
DOIs
Publication statusPublished - 28 May 2018
MoE publication typeA1 Journal article-refereed

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atomic layer epitaxy
high aspect ratio
kinetics
thin films
adsorption
plugs
surface reactions
low pressure
propagation
silicon
coefficients
profiles
gases
simulation

Cite this

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abstract = "The conformality of thin films grown by atomic layer deposition (ALD) is studied using all-silicon test structures with long narrow lateral channels. A diffusion model, developed in this work, is used for studying the propagation of ALD growth in narrow channels. The diffusion model takes into account the gas transportation at low pressures, the dynamic Langmuir adsorption model for the film growth and the effect of channel narrowing due to film growth. The film growth is calculated by solving the diffusion equation with surface reactions. An efficient analytic approximate solution of the diffusion equation is developed for fitting the model to the measured thickness profile. The fitting gives the equilibrium constant of adsorption and the sticking coefficient. This model and Gordon's plug flow model are compared. The simulations predict the experimental measurement results quite well for Al2O3 and TiO2 ALD processes.",
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Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures. / Ylilammi, Markku (Corresponding Author); Ylivaara, Oili M.E.; Puurunen, Riikka L.

In: Journal of Applied Physics, Vol. 123, No. 20, 205301, 28.05.2018.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Ylivaara, Oili M.E.

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AB - The conformality of thin films grown by atomic layer deposition (ALD) is studied using all-silicon test structures with long narrow lateral channels. A diffusion model, developed in this work, is used for studying the propagation of ALD growth in narrow channels. The diffusion model takes into account the gas transportation at low pressures, the dynamic Langmuir adsorption model for the film growth and the effect of channel narrowing due to film growth. The film growth is calculated by solving the diffusion equation with surface reactions. An efficient analytic approximate solution of the diffusion equation is developed for fitting the model to the measured thickness profile. The fitting gives the equilibrium constant of adsorption and the sticking coefficient. This model and Gordon's plug flow model are compared. The simulations predict the experimental measurement results quite well for Al2O3 and TiO2 ALD processes.

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