INIS
layers
100%
aspect ratio
100%
kinetics
100%
growth
100%
modeling
100%
thin films
100%
deposition
100%
films
60%
diffusion
40%
adsorption
40%
diffusion equations
40%
simulation
20%
solutions
20%
comparative evaluations
20%
surfaces
20%
dynamics
20%
thickness
20%
silicon
20%
approximations
20%
equilibrium
20%
titanium oxides
20%
gases
20%
low pressure
20%
plugs
20%
flow models
20%
Keyphrases
Atomic Layer Deposition
100%
Growth Kinetics
100%
Modelling Growth
100%
High Aspect Ratio Structure
100%
Film Growth
75%
Diffusion Equation
50%
Diffusion Model
50%
Rutile
25%
Aluminum Oxide
25%
Conformality
25%
Measurement Results
25%
Adsorption
25%
Low Pressure
25%
Sticking Coefficient
25%
Surface Reaction
25%
Channel Narrowing
25%
Lateral Channel
25%
Equilibrium Constant
25%
Gas Transportation
25%
Plug-flow Model
25%
All-silicon
25%
Langmuir Model
25%
Narrow Channel
25%
Analytic Approximate Solution
25%
Thickness Profile
25%
Engineering
Growth Kinetics
100%
Atomic Layer Deposition
100%
High Aspect Ratio
100%
Thin Films
100%
Diffusion Model
50%
Diffusion Equation
50%
Conformality
25%
Test Structure
25%
Experimental Measurement
25%
Approximate Solution
25%
Langmuir Adsorption
25%
Narrow Channel
25%
Deposition Process
25%
Equilibrium Constant
25%
Flow Model
25%
Plug Flow
25%
Material Science
Film Growth
100%
Thin Films
100%
Titanium Dioxide
33%
Silicon
33%
Surface Reaction
33%
Aluminum Oxide
33%