Molecular beam epitaxy of p-type ZnSSe using a nitric oxide plasma source

P. Uusimaa (Corresponding Author), Keijo Rakennus, A. Salokatve, Markus Pessa, Jari Likonen

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Pages (from-to)2426 - 2427
Number of pages2
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume15
Issue number4
DOIs
Publication statusPublished - 1997
MoE publication typeA1 Journal article-refereed

Cite this

Uusimaa, P. ; Rakennus, Keijo ; Salokatve, A. ; Pessa, Markus ; Likonen, Jari. / Molecular beam epitaxy of p-type ZnSSe using a nitric oxide plasma source. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 1997 ; Vol. 15, No. 4. pp. 2426 - 2427.
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pages = "2426 -- 2427",
journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",
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Molecular beam epitaxy of p-type ZnSSe using a nitric oxide plasma source. / Uusimaa, P. (Corresponding Author); Rakennus, Keijo; Salokatve, A.; Pessa, Markus; Likonen, Jari.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 15, No. 4, 1997, p. 2426 - 2427.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Molecular beam epitaxy of p-type ZnSSe using a nitric oxide plasma source

AU - Uusimaa, P.

AU - Rakennus, Keijo

AU - Salokatve, A.

AU - Pessa, Markus

AU - Likonen, Jari

N1 - Project code: KET4134

PY - 1997

Y1 - 1997

U2 - 10.1116/1.580758

DO - 10.1116/1.580758

M3 - Article

VL - 15

SP - 2426

EP - 2427

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

SN - 0734-2101

IS - 4

ER -