INIS
layers
100%
aspect ratio
100%
monitoring
100%
deposition
100%
manufacturing
100%
variations
30%
environment
20%
scanning electron microscopy
20%
range
20%
control
10%
data
10%
metrics
10%
substrates
10%
thin films
10%
films
10%
gain
10%
walls
10%
cavities
10%
accuracy
10%
metrology
10%
cross sections
10%
cleavage
10%
carriers
10%
zirconium oxides
10%
sims
10%
sample preparation
10%
optical microscopes
10%
Keyphrases
High Aspect Ratio
100%
Atomic Layer Deposition
100%
Ratio Test
100%
Conformality
100%
Process Variation
30%
Metrology
10%
Response Time
10%
MEMS-based
10%
Response Data
10%
Wafer
10%
Deposition Technology
10%
Sample Preparation
10%
Cleanliness
10%
Manufacturing Environment
10%
Film Characterization
10%
Time-of-flight Secondary Ion Mass Spectrometry (ToF-SIMS)
10%
Carrier Wafer
10%
Cleanroom
10%
Fraunhofer
10%
Number of Cycles
10%
Cross-sectional Sample
10%
Optical Microscope
10%
Step Coverage
10%
Vertically Oriented
10%
Thin Slices
10%
Accuracy Limits
10%
ZrO2-Al2O3
10%
Eureka
10%
Long Response
10%
Cleavage Plane
10%
Microstructured Substrate
10%
Engineering
Conformality
100%
Test Structure
100%
Atomic Layer Deposition
100%
High Aspect Ratio
100%
Process Variation
30%
Deposition Technology
10%
Cleanroom
10%
Microelectromechanical System
10%
Metrics
10%
Design and Environment
10%
Cross Section
10%
Thin Films
10%
Response Time
10%
Deposition Process
10%
Optical Microscope
10%
Material Science
Scanning Electron Microscopy
100%
Al2O3
50%
Zirconia
50%
Film
50%
Microelectromechanical System
50%
Secondary Ion Mass Spectrometry
50%
Thin Films
50%