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Monolayer thickness in atomic layer deposition
Markku Ylilammi
Research output
:
Contribution to journal
›
Article
›
Scientific
›
peer-review
126
Citations (Scopus)
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INIS
adsorption
50%
chemisorption
25%
comparative evaluations
25%
configuration
25%
density
25%
deposition
100%
epitaxy
25%
fluorides
25%
geometry
25%
growth
100%
layers
100%
levels
25%
molecules
25%
operation
25%
oxides
25%
sulfides
25%
surfaces
75%
thickness
100%
thin films
25%
values
25%
Material Science
Chemisorption
100%
Density
100%
Epitaxy
100%
Monolayers
100%
Oxide Compound
100%
Surface Reaction
100%
Thin Films
100%
Keyphrases
Adsorption
25%
Adsorption Sites
25%
Atomic Layer Deposition
100%
Atomic Layer Epitaxy
25%
Binary Oxide
25%
Chemisorption
25%
Experimental Values
25%
Fluoride
25%
Growth Rate
100%
Layer Thickness
25%
Molecular Description
25%
Monolayer Thickness
100%
One-cycle
25%
Operation Conditions
25%
Reaction Steps
25%
Sulfide
25%
Surface Configuration
25%
Surface Reaction
25%
Engineering
Adsorption
100%
Atomic Layer Deposition
100%
Constant Level
50%
Experimental Value
50%
Layer Thickness
50%
Monolayer
100%
Reactant
50%
Thin Films
50%
Chemical Engineering
Adsorption
100%
Atomic Layer Deposition
100%
Chemisorption
50%
Epitaxial Growth
50%