Abstract
We report an integrated monolithic micromechanical capacitive pressure sensor circuit based on novel method for fabricating pressure detecting vacuum cavities into buried oxide of SOI-wafer. The method allows fabricating the readout circuit with standard bulk CMOS process. The readout circuit of the pressure sensor is a low-power CMOS relaxation oscillator.
Original language | English |
---|---|
Title of host publication | ESSCIRC 2003, Proceedings of the 29th European Solid-State Circuits Conference |
Publisher | IEEE Institute of Electrical and Electronic Engineers |
Pages | 611-614 |
ISBN (Print) | 0-7803-7995-0 |
DOIs | |
Publication status | Published - 2003 |
MoE publication type | B3 Non-refereed article in conference proceedings |
Event | 29th European Solid-State Circuits Conference, ESSCIRC 2003 - Estoril, Portugal Duration: 16 Sept 2003 → 18 Sept 2003 Conference number: 29 |
Conference
Conference | 29th European Solid-State Circuits Conference, ESSCIRC 2003 |
---|---|
Abbreviated title | ESSCIRC 2003 |
Country/Territory | Portugal |
City | Estoril |
Period | 16/09/03 → 18/09/03 |
Keywords
- capacitive pressure sensor
- MEMS