Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography

Muhammad Umar Khan (Corresponding Author), John Justice, Jarno Petäjä, Tia Korhonen, Arjen Boersma, Sjoukje Wiegersma, Mikko Karppinen, Brian Corbett

    Research output: Contribution to journalArticleScientificpeer-review

    38 Citations (Scopus)


    Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index contrast between core and cladding of fabricated devices. 1x2 splitting devices based on directional couplers and multimode interference interferometers are demonstrated to have less than 0.45 dB insertion loss with 0.02 ± 0.01 dB power imbalance between the outputs. We demonstrate an 'optical via' with an insertion loss less than 0.45 dB to transfer light from one optical signal plane to another. A 1x4 two-dimensional optical port is experimentally demonstrated to spatially split the input power with an insertion loss of 1.2 dB.
    Original languageEnglish
    Pages (from-to)14630-14639
    JournalOptics Express
    Issue number11
    Publication statusPublished - 2015
    MoE publication typeA1 Journal article-refereed


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