Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography

Muhammad Umar Khan (Corresponding Author), John Justice, Jarno Petäjä, Tia Korhonen, Arjen Boersma, Sjoukje Wiegersma, Mikko Karppinen, Brian Corbett

Research output: Contribution to journalArticleScientificpeer-review

17 Citations (Scopus)

Abstract

Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index contrast between core and cladding of fabricated devices. 1x2 splitting devices based on directional couplers and multimode interference interferometers are demonstrated to have less than 0.45 dB insertion loss with 0.02 ± 0.01 dB power imbalance between the outputs. We demonstrate an 'optical via' with an insertion loss less than 0.45 dB to transfer light from one optical signal plane to another. A 1x4 two-dimensional optical port is experimentally demonstrated to spatially split the input power with an insertion loss of 1.2 dB.
Original languageEnglish
Pages (from-to)14630-14639
JournalOptics Express
Volume23
Issue number11
DOIs
Publication statusPublished - 2015
MoE publication typeA1 Journal article-refereed

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optical interconnects
insertion loss
lithography
waveguides
polymers
directional couplers
optical communication
interferometers
interference
fabrication
output

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Khan, M. U., Justice, J., Petäjä, J., Korhonen, T., Boersma, A., Wiegersma, S., ... Corbett, B. (2015). Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography. Optics Express, 23(11), 14630-14639. https://doi.org/10.1364/OE.23.014630
Khan, Muhammad Umar ; Justice, John ; Petäjä, Jarno ; Korhonen, Tia ; Boersma, Arjen ; Wiegersma, Sjoukje ; Karppinen, Mikko ; Corbett, Brian. / Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography. In: Optics Express. 2015 ; Vol. 23, No. 11. pp. 14630-14639.
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abstract = "Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index contrast between core and cladding of fabricated devices. 1x2 splitting devices based on directional couplers and multimode interference interferometers are demonstrated to have less than 0.45 dB insertion loss with 0.02 ± 0.01 dB power imbalance between the outputs. We demonstrate an 'optical via' with an insertion loss less than 0.45 dB to transfer light from one optical signal plane to another. A 1x4 two-dimensional optical port is experimentally demonstrated to spatially split the input power with an insertion loss of 1.2 dB.",
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Khan, MU, Justice, J, Petäjä, J, Korhonen, T, Boersma, A, Wiegersma, S, Karppinen, M & Corbett, B 2015, 'Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography', Optics Express, vol. 23, no. 11, pp. 14630-14639. https://doi.org/10.1364/OE.23.014630

Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography. / Khan, Muhammad Umar (Corresponding Author); Justice, John; Petäjä, Jarno; Korhonen, Tia; Boersma, Arjen; Wiegersma, Sjoukje; Karppinen, Mikko; Corbett, Brian.

In: Optics Express, Vol. 23, No. 11, 2015, p. 14630-14639.

Research output: Contribution to journalArticleScientificpeer-review

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