Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors

Pai Lu; Per A. Ohlckers; Lutz Müller; Steffen Leopold; Martin J. F. Hoffmann; Kestutis Grigoras; Jouni Ahopelto; Mika Prunnila; Xuyuan Chen

doi:10.1016/j.elecom.2016.07.002

Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors

Pai Lu, Per A. Ohlckers, Lutz Müller, Steffen Leopold, Martin J. F. Hoffmann, Kestutis Grigoras, Jouni Ahopelto, Mika Prunnila, Xuyuan Chen

Research output: Contribution to journal › Article › Scientific › peer-review

49 Citations (Scopus)

Abstract

We demonstrate high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor. By unique atomic layer deposition (ALD) technology, a conformal nanolayer of TiN was deposited on the silicon nanorod arrays as the active material. The TiN coated silicon nanorods as a supercapacitor electrode lead to a 6 times improvement in capacitance compared to flat TiN film electrode.

Original language	English
Pages (from-to)	51-55
Journal	Electrochemistry Communications
Volume	70
DOIs	https://doi.org/10.1016/j.elecom.2016.07.002
Publication status	Published - 2016
MoE publication type	A1 Journal article-refereed

Keywords

aspect ratio
atomic layer deposition
electrodes
reactive ion etching
scaffolds
silicon
titanium compounds
titanium nitride
deep reactive Ion etching
DRIE
nano films
nano-rod arrays
super capacitor
supercapacitor electrodes
tin film electrodes
titanium nitride coating

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10.1016/j.elecom.2016.07.002

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title = "Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors",

abstract = "We demonstrate high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor. By unique atomic layer deposition (ALD) technology, a conformal nanolayer of TiN was deposited on the silicon nanorod arrays as the active material. The TiN coated silicon nanorods as a supercapacitor electrode lead to a 6 times improvement in capacitance compared to flat TiN film electrode.",

keywords = "aspect ratio, atomic layer deposition, electrodes, reactive ion etching, scaffolds, silicon, titanium compounds, titanium nitride, deep reactive Ion etching, DRIE, nano films, nano-rod arrays, super capacitor, supercapacitor electrodes, tin film electrodes, titanium nitride coating",

author = "Pai Lu and Ohlckers, {Per A.} and Lutz M{\"u}ller and Steffen Leopold and Hoffmann, {Martin J. F.} and Kestutis Grigoras and Jouni Ahopelto and Mika Prunnila and Xuyuan Chen",

year = "2016",

doi = "10.1016/j.elecom.2016.07.002",

language = "English",

volume = "70",

pages = "51--55",

journal = "Electrochemistry Communications",

issn = "1388-2481",

publisher = "Elsevier",

}

TY - JOUR

T1 - Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors

AU - Lu, Pai

AU - Ohlckers, Per A.

AU - Müller, Lutz

AU - Leopold, Steffen

AU - Hoffmann, Martin J. F.

AU - Grigoras, Kestutis

AU - Ahopelto, Jouni

AU - Prunnila, Mika

AU - Chen, Xuyuan

PY - 2016

Y1 - 2016

N2 - We demonstrate high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor. By unique atomic layer deposition (ALD) technology, a conformal nanolayer of TiN was deposited on the silicon nanorod arrays as the active material. The TiN coated silicon nanorods as a supercapacitor electrode lead to a 6 times improvement in capacitance compared to flat TiN film electrode.

AB - We demonstrate high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor. By unique atomic layer deposition (ALD) technology, a conformal nanolayer of TiN was deposited on the silicon nanorod arrays as the active material. The TiN coated silicon nanorods as a supercapacitor electrode lead to a 6 times improvement in capacitance compared to flat TiN film electrode.

KW - aspect ratio

KW - atomic layer deposition

KW - electrodes

KW - reactive ion etching

KW - scaffolds

KW - silicon

KW - titanium compounds

KW - titanium nitride

KW - deep reactive Ion etching

KW - DRIE

KW - nano films

KW - nano-rod arrays

KW - super capacitor

KW - supercapacitor electrodes

KW - tin film electrodes

KW - titanium nitride coating

U2 - 10.1016/j.elecom.2016.07.002

DO - 10.1016/j.elecom.2016.07.002

M3 - Article

SN - 1388-2481

VL - 70

SP - 51

EP - 55

JO - Electrochemistry Communications

JF - Electrochemistry Communications

ER -

Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors

Abstract

Keywords

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