Nanoimprint fabrication process for hybrid 3D stamps

Tomi Haatainen, Tapio Mäkelä, Arne Schleunitz, G. Grenci, Massimo Tormen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

Abstract

In this work, we used a poly(methyl methacrylate) (PMMA) substrate which was at first pre-patterned with a nanoscale binary line grating by thermal NIL. A rather thick polymer slab (3 mm) ensured a sufficient mechanical stability when the substrate is exposed to the heat load of a second thermal imprint step. The linear grating was replicated onto the PMMA slab at 165 °C. A reduced pressure of 0.25 MPa enabled the generation of a surface patterning without reducing the slab thickness, which was previously observed for increased temperatures and imprint pressure. The second imprint was added into the linear surface-gratings by thermal imprinting using a nickel stamp with micron scale blaze gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with rotation imprint head. The rotating head introduces ability to control X/Y positioning and angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°
Original languageEnglish
Title of host publicationConference Program and Proceeding Book
Subtitle of host publicationThe 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011), Jeju, Korea, 19 - 21 October 2011
Publication statusPublished - 2011
MoE publication typeNot Eligible

Fingerprint

gratings
fabrication
slabs
polymethyl methacrylate
positioning
lithography
nickel
heat
polymers
temperature

Keywords

  • NIL
  • nanoimprinting
  • SSIL

Cite this

Haatainen, T., Mäkelä, T., Schleunitz, A., Grenci, G., & Tormen, M. (2011). Nanoimprint fabrication process for hybrid 3D stamps. In Conference Program and Proceeding Book: The 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011), Jeju, Korea, 19 - 21 October 2011 [213]
Haatainen, Tomi ; Mäkelä, Tapio ; Schleunitz, Arne ; Grenci, G. ; Tormen, Massimo. / Nanoimprint fabrication process for hybrid 3D stamps. Conference Program and Proceeding Book: The 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011), Jeju, Korea, 19 - 21 October 2011. 2011.
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title = "Nanoimprint fabrication process for hybrid 3D stamps",
abstract = "In this work, we used a poly(methyl methacrylate) (PMMA) substrate which was at first pre-patterned with a nanoscale binary line grating by thermal NIL. A rather thick polymer slab (3 mm) ensured a sufficient mechanical stability when the substrate is exposed to the heat load of a second thermal imprint step. The linear grating was replicated onto the PMMA slab at 165 °C. A reduced pressure of 0.25 MPa enabled the generation of a surface patterning without reducing the slab thickness, which was previously observed for increased temperatures and imprint pressure. The second imprint was added into the linear surface-gratings by thermal imprinting using a nickel stamp with micron scale blaze gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with rotation imprint head. The rotating head introduces ability to control X/Y positioning and angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°",
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author = "Tomi Haatainen and Tapio M{\"a}kel{\"a} and Arne Schleunitz and G. Grenci and Massimo Tormen",
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booktitle = "Conference Program and Proceeding Book",

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Haatainen, T, Mäkelä, T, Schleunitz, A, Grenci, G & Tormen, M 2011, Nanoimprint fabrication process for hybrid 3D stamps. in Conference Program and Proceeding Book: The 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011), Jeju, Korea, 19 - 21 October 2011., 213.

Nanoimprint fabrication process for hybrid 3D stamps. / Haatainen, Tomi; Mäkelä, Tapio; Schleunitz, Arne; Grenci, G.; Tormen, Massimo.

Conference Program and Proceeding Book: The 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011), Jeju, Korea, 19 - 21 October 2011. 2011. 213.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

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T1 - Nanoimprint fabrication process for hybrid 3D stamps

AU - Haatainen, Tomi

AU - Mäkelä, Tapio

AU - Schleunitz, Arne

AU - Grenci, G.

AU - Tormen, Massimo

N1 - Project code: 21975 NAPANIL

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Y1 - 2011

N2 - In this work, we used a poly(methyl methacrylate) (PMMA) substrate which was at first pre-patterned with a nanoscale binary line grating by thermal NIL. A rather thick polymer slab (3 mm) ensured a sufficient mechanical stability when the substrate is exposed to the heat load of a second thermal imprint step. The linear grating was replicated onto the PMMA slab at 165 °C. A reduced pressure of 0.25 MPa enabled the generation of a surface patterning without reducing the slab thickness, which was previously observed for increased temperatures and imprint pressure. The second imprint was added into the linear surface-gratings by thermal imprinting using a nickel stamp with micron scale blaze gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with rotation imprint head. The rotating head introduces ability to control X/Y positioning and angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°

AB - In this work, we used a poly(methyl methacrylate) (PMMA) substrate which was at first pre-patterned with a nanoscale binary line grating by thermal NIL. A rather thick polymer slab (3 mm) ensured a sufficient mechanical stability when the substrate is exposed to the heat load of a second thermal imprint step. The linear grating was replicated onto the PMMA slab at 165 °C. A reduced pressure of 0.25 MPa enabled the generation of a surface patterning without reducing the slab thickness, which was previously observed for increased temperatures and imprint pressure. The second imprint was added into the linear surface-gratings by thermal imprinting using a nickel stamp with micron scale blaze gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with rotation imprint head. The rotating head introduces ability to control X/Y positioning and angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°

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Haatainen T, Mäkelä T, Schleunitz A, Grenci G, Tormen M. Nanoimprint fabrication process for hybrid 3D stamps. In Conference Program and Proceeding Book: The 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011), Jeju, Korea, 19 - 21 October 2011. 2011. 213