Abstract
In this work, we used a poly(methyl methacrylate) (PMMA) substrate which was at first pre-patterned with a nanoscale binary line grating by thermal NIL. A rather thick polymer slab (3 mm) ensured a sufficient mechanical stability when the substrate is exposed to the heat load of a second thermal imprint step. The linear grating was replicated onto the PMMA slab at 165 °C. A reduced pressure of 0.25 MPa enabled the generation of a surface patterning without reducing the slab thickness, which was previously observed for increased temperatures and imprint pressure. The second imprint was added into the linear surface-gratings by thermal imprinting using a nickel stamp with micron scale blaze gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with rotation imprint head. The rotating head introduces ability to control X/Y positioning and angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°
| Original language | English |
|---|---|
| Title of host publication | Conference Program and Proceeding Book |
| Subtitle of host publication | The 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011), Jeju, Korea, 19 - 21 October 2011 |
| Publication status | Published - 2011 |
| MoE publication type | Not Eligible |
Keywords
- NIL
- nanoimprinting
- SSIL