Nanoimprint lithography: An alternative nanofabrication approach

C.M. Sotomayor Torres; S. Zankovych; J. Seekamp; A. P. Kam; C. Clavijo Cedeño; T. Hoffmann; Jouni Ahopelto; F. Reuther; K. Pfeiffer; G. Bleidiessel; G. Gruetzner; M. V. Maximov; B. Heidari

doi:10.1016/S0928-4931(02)00221-7

Nanoimprint lithography: An alternative nanofabrication approach

C.M. Sotomayor Torres (Corresponding Author), S. Zankovych, J. Seekamp, A. P. Kam, C. Clavijo Cedeño, T. Hoffmann, Jouni Ahopelto, F. Reuther, K. Pfeiffer, G. Bleidiessel, G. Gruetzner, M. V. Maximov, B. Heidari

Research output: Contribution to journal › Article › Scientific › peer-review

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Abstract

A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.

Original language	English
Pages (from-to)	23-31
Number of pages	9
Journal	Materials Science and Engineering C: Materials for Biological Applications
Volume	23
Issue number	1-2
DOIs	https://doi.org/10.1016/S0928-4931(02)00221-7
Publication status	Published - 2003
MoE publication type	A1 Journal article-refereed

Keywords

nanofabrication
nanoimprint lithography
polymer moulding

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10.1016/S0928-4931(02)00221-7

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Sotomayor Torres, C. M., Zankovych, S., Seekamp, J., Kam, A. P., Cedeño, C. C., Hoffmann, T., Ahopelto, J., Reuther, F., Pfeiffer, K., Bleidiessel, G., Gruetzner, G., Maximov, M. V., & Heidari, B. (2003). Nanoimprint lithography: An alternative nanofabrication approach. Materials Science and Engineering C: Materials for Biological Applications, 23(1-2), 23-31. https://doi.org/10.1016/S0928-4931(02)00221-7

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abstract = "A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.",

keywords = "nanofabrication, nanoimprint lithography, polymer moulding",

author = "{Sotomayor Torres}, C.M. and S. Zankovych and J. Seekamp and Kam, {A. P.} and Cede{\~n}o, {C. Clavijo} and T. Hoffmann and Jouni Ahopelto and F. Reuther and K. Pfeiffer and G. Bleidiessel and G. Gruetzner and Maximov, {M. V.} and B. Heidari",

year = "2003",

doi = "10.1016/S0928-4931(02)00221-7",

language = "English",

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Sotomayor Torres, CM, Zankovych, S, Seekamp, J, Kam, AP, Cedeño, CC, Hoffmann, T, Ahopelto, J, Reuther, F, Pfeiffer, K, Bleidiessel, G, Gruetzner, G, Maximov, MV & Heidari, B 2003, 'Nanoimprint lithography: An alternative nanofabrication approach', Materials Science and Engineering C: Materials for Biological Applications, vol. 23, no. 1-2, pp. 23-31. https://doi.org/10.1016/S0928-4931(02)00221-7

TY - JOUR

T1 - Nanoimprint lithography

T2 - An alternative nanofabrication approach

AU - Sotomayor Torres, C.M.

AU - Zankovych, S.

AU - Seekamp, J.

AU - Kam, A. P.

AU - Cedeño, C. Clavijo

AU - Hoffmann, T.

AU - Ahopelto, Jouni

AU - Reuther, F.

AU - Pfeiffer, K.

AU - Bleidiessel, G.

AU - Gruetzner, G.

AU - Maximov, M. V.

AU - Heidari, B.

PY - 2003

Y1 - 2003

N2 - A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.

AB - A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.

KW - nanofabrication

KW - nanoimprint lithography

KW - polymer moulding

U2 - 10.1016/S0928-4931(02)00221-7

DO - 10.1016/S0928-4931(02)00221-7

M3 - Article

SN - 0928-4931

VL - 23

SP - 23

EP - 31

JO - Materials Science and Engineering C: Materials for Biological Applications

JF - Materials Science and Engineering C: Materials for Biological Applications

IS - 1-2

ER -

Nanoimprint lithography: An alternative nanofabrication approach

Abstract

Keywords

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