Nanoimprint lithography: An alternative nanofabrication approach

  • C.M. Sotomayor Torres*
  • , S. Zankovych
  • , J. Seekamp
  • , A.P. Kam
  • , C. Clavijo Cedeño
  • , T. Hoffmann
  • , Jouni Ahopelto
  • , F. Reuther
  • , K. Pfeiffer
  • , G. Bleidiessel
  • , G. Gruetzner
  • , M.V. Maximov
  • , B. Heidari
  • *Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

Abstract

A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.
Original languageEnglish
Pages (from-to)23-31
JournalMaterials Science and Engineering C: Materials for Biological Applications
Volume23
Issue number1-2
DOIs
Publication statusPublished - 2003
MoE publication typeA1 Journal article-refereed

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 9 - Industry, Innovation, and Infrastructure
    SDG 9 Industry, Innovation, and Infrastructure

Keywords

  • nanofabrication
  • nanoimprint lithography
  • polymer moulding

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