Nanoimprint lithography: An alternative nanofabrication approach

C.M. Sotomayor Torres; S. Zankovych; J. Seekamp; A.P. Kam; C. Clavijo Cedeño; T. Hoffmann; Jouni Ahopelto; F. Reuther; K. Pfeiffer; G. Bleidiessel; G. Gruetzner; M.V. Maximov; B. Heidari

doi:10.1016/S0928-4931(02)00221-7

Nanoimprint lithography: An alternative nanofabrication approach

C.M. Sotomayor Torres^*
, S. Zankovych
, J. Seekamp
, A.P. Kam
, C. Clavijo Cedeño
, T. Hoffmann
, Jouni Ahopelto
, F. Reuther
, K. Pfeiffer
, G. Bleidiessel
, G. Gruetzner
, M.V. Maximov
, B. Heidari

^*Corresponding author for this work

Obducat AB
University of Wuppertal
Micro Resist Technology GmbH
Ioffe Institute

Research output: Contribution to journal › Article › Scientific › peer-review

178 Citations (Scopus)

Abstract

A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.

Original language	English
Pages (from-to)	23-31
Journal	Materials Science and Engineering C
Volume	23
Issue number	1-2
DOIs	https://doi.org/10.1016/S0928-4931(02)00221-7
Publication status	Published - 2003
MoE publication type	A1 Journal article-refereed

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

nanofabrication
nanoimprint lithography
polymer moulding

Access to Document

10.1016/S0928-4931(02)00221-7

Cite this

Sotomayor Torres, C. M., Zankovych, S., Seekamp, J., Kam, A. P., Cedeño, C. C., Hoffmann, T., Ahopelto, J., Reuther, F., Pfeiffer, K., Bleidiessel, G., Gruetzner, G., Maximov, M. V., & Heidari, B. (2003). Nanoimprint lithography: An alternative nanofabrication approach. Materials Science and Engineering C, 23(1-2), 23-31. https://doi.org/10.1016/S0928-4931(02)00221-7

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abstract = "A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.",

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doi = "10.1016/S0928-4931(02)00221-7",

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AU - Sotomayor Torres, C.M.

AU - Zankovych, S.

AU - Seekamp, J.

AU - Kam, A.P.

AU - Cedeño, C. Clavijo

AU - Hoffmann, T.

AU - Ahopelto, Jouni

AU - Reuther, F.

AU - Pfeiffer, K.

AU - Bleidiessel, G.

AU - Gruetzner, G.

AU - Maximov, M.V.

AU - Heidari, B.

PY - 2003

Y1 - 2003

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AB - A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.

KW - nanofabrication

KW - nanoimprint lithography

KW - polymer moulding

U2 - 10.1016/S0928-4931(02)00221-7

DO - 10.1016/S0928-4931(02)00221-7

M3 - Article

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EP - 31

JO - Materials Science and Engineering C

JF - Materials Science and Engineering C

IS - 1-2

ER -

Nanoimprint lithography: An alternative nanofabrication approach

Abstract

UN SDGs

Keywords

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