Nanoimprinted passive optical devices

J. Seekamp (Corresponding Author), S. Sankovych, A.H. Helfer, P. Maury, C.M. Sotomayor Torres, C. Boettger, C. Liguda, B. Eich, B. Heidari, L. Montelius, Jouni Ahopelto

    Research output: Contribution to journalArticleScientificpeer-review

    56 Citations (Scopus)

    Abstract

    We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm-1 at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp.
    Original languageEnglish
    Pages (from-to)581-586
    JournalNanotechnology
    Volume13
    Issue number5
    DOIs
    Publication statusPublished - 2002
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Polystyrenes
    Polymethyl Methacrylate
    Optical devices
    Nanoimprint lithography
    Silicon oxides
    Diffraction gratings
    Full width at half maximum
    Photonics
    Atomic force microscopy
    Refractive index
    Waveguides
    Wavelength

    Keywords

    • nanoimprint lithography
    • passive optical devices
    • nanofabrication
    • etching

    Cite this

    Seekamp, J., Sankovych, S., Helfer, A. H., Maury, P., Sotomayor Torres, C. M., Boettger, C., ... Ahopelto, J. (2002). Nanoimprinted passive optical devices. Nanotechnology, 13(5), 581-586. https://doi.org/10.1088/0957-4484/13/5/307
    Seekamp, J. ; Sankovych, S. ; Helfer, A.H. ; Maury, P. ; Sotomayor Torres, C.M. ; Boettger, C. ; Liguda, C. ; Eich, B. ; Heidari, B. ; Montelius, L. ; Ahopelto, Jouni. / Nanoimprinted passive optical devices. In: Nanotechnology. 2002 ; Vol. 13, No. 5. pp. 581-586.
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    abstract = "We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm-1 at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp.",
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    author = "J. Seekamp and S. Sankovych and A.H. Helfer and P. Maury and {Sotomayor Torres}, C.M. and C. Boettger and C. Liguda and B. Eich and B. Heidari and L. Montelius and Jouni Ahopelto",
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    Seekamp, J, Sankovych, S, Helfer, AH, Maury, P, Sotomayor Torres, CM, Boettger, C, Liguda, C, Eich, B, Heidari, B, Montelius, L & Ahopelto, J 2002, 'Nanoimprinted passive optical devices', Nanotechnology, vol. 13, no. 5, pp. 581-586. https://doi.org/10.1088/0957-4484/13/5/307

    Nanoimprinted passive optical devices. / Seekamp, J. (Corresponding Author); Sankovych, S.; Helfer, A.H.; Maury, P.; Sotomayor Torres, C.M.; Boettger, C.; Liguda, C.; Eich, B.; Heidari, B.; Montelius, L.; Ahopelto, Jouni.

    In: Nanotechnology, Vol. 13, No. 5, 2002, p. 581-586.

    Research output: Contribution to journalArticleScientificpeer-review

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    AU - Seekamp, J.

    AU - Sankovych, S.

    AU - Helfer, A.H.

    AU - Maury, P.

    AU - Sotomayor Torres, C.M.

    AU - Boettger, C.

    AU - Liguda, C.

    AU - Eich, B.

    AU - Heidari, B.

    AU - Montelius, L.

    AU - Ahopelto, Jouni

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    AB - We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm-1 at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp.

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    Seekamp J, Sankovych S, Helfer AH, Maury P, Sotomayor Torres CM, Boettger C et al. Nanoimprinted passive optical devices. Nanotechnology. 2002;13(5):581-586. https://doi.org/10.1088/0957-4484/13/5/307