Nanoimprinted passive optical devices

J. Seekamp (Corresponding Author), S. Sankovych, A.H. Helfer, P. Maury, C.M. Sotomayor Torres, C. Boettger, C. Liguda, B. Eich, B. Heidari, L. Montelius, Jouni Ahopelto

Research output: Contribution to journalArticleScientificpeer-review

56 Citations (Scopus)

Abstract

We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm-1 at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp.
Original languageEnglish
Pages (from-to)581-586
JournalNanotechnology
Volume13
Issue number5
DOIs
Publication statusPublished - 2002
MoE publication typeA1 Journal article-refereed

Fingerprint

Polystyrenes
Polymethyl Methacrylate
Optical devices
Nanoimprint lithography
Silicon oxides
Diffraction gratings
Full width at half maximum
Photonics
Atomic force microscopy
Refractive index
Waveguides
Wavelength

Keywords

  • nanoimprint lithography
  • passive optical devices
  • nanofabrication
  • etching

Cite this

Seekamp, J., Sankovych, S., Helfer, A. H., Maury, P., Sotomayor Torres, C. M., Boettger, C., ... Ahopelto, J. (2002). Nanoimprinted passive optical devices. Nanotechnology, 13(5), 581-586. https://doi.org/10.1088/0957-4484/13/5/307
Seekamp, J. ; Sankovych, S. ; Helfer, A.H. ; Maury, P. ; Sotomayor Torres, C.M. ; Boettger, C. ; Liguda, C. ; Eich, B. ; Heidari, B. ; Montelius, L. ; Ahopelto, Jouni. / Nanoimprinted passive optical devices. In: Nanotechnology. 2002 ; Vol. 13, No. 5. pp. 581-586.
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Seekamp, J, Sankovych, S, Helfer, AH, Maury, P, Sotomayor Torres, CM, Boettger, C, Liguda, C, Eich, B, Heidari, B, Montelius, L & Ahopelto, J 2002, 'Nanoimprinted passive optical devices', Nanotechnology, vol. 13, no. 5, pp. 581-586. https://doi.org/10.1088/0957-4484/13/5/307

Nanoimprinted passive optical devices. / Seekamp, J. (Corresponding Author); Sankovych, S.; Helfer, A.H.; Maury, P.; Sotomayor Torres, C.M.; Boettger, C.; Liguda, C.; Eich, B.; Heidari, B.; Montelius, L.; Ahopelto, Jouni.

In: Nanotechnology, Vol. 13, No. 5, 2002, p. 581-586.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Seekamp, J.

AU - Sankovych, S.

AU - Helfer, A.H.

AU - Maury, P.

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AU - Boettger, C.

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AU - Montelius, L.

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AB - We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm-1 at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp.

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Seekamp J, Sankovych S, Helfer AH, Maury P, Sotomayor Torres CM, Boettger C et al. Nanoimprinted passive optical devices. Nanotechnology. 2002;13(5):581-586. https://doi.org/10.1088/0957-4484/13/5/307