Nanoimprinted passive optical devices

J. Seekamp (Corresponding Author), S. Sankovych, A.H. Helfer, P. Maury, C.M. Sotomayor Torres, C. Boettger, C. Liguda, B. Eich, B. Heidari, L. Montelius, Jouni Ahopelto

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    Abstract

    We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm-1 at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp.
    Original languageEnglish
    Pages (from-to)581-586
    JournalNanotechnology
    Volume13
    Issue number5
    DOIs
    Publication statusPublished - 2002
    MoE publication typeA1 Journal article-refereed

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    Keywords

    • nanoimprint lithography
    • passive optical devices
    • nanofabrication
    • etching

    Cite this

    Seekamp, J., Sankovych, S., Helfer, A. H., Maury, P., Sotomayor Torres, C. M., Boettger, C., Liguda, C., Eich, B., Heidari, B., Montelius, L., & Ahopelto, J. (2002). Nanoimprinted passive optical devices. Nanotechnology, 13(5), 581-586. https://doi.org/10.1088/0957-4484/13/5/307