Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting

S. Zankovych, J. Seekamp, C. Cedeno, C. Sotomayor Torres, Jouni Ahopelto, K. Pfeiffer, D. Reuther, A. Wieck

Research output: Contribution to conferenceConference articleScientific

Original languageEnglish
Publication statusPublished - 2001
MoE publication typeNot Eligible
Event8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001 - Wurzburg, Germany
Duration: 4 Jul 20016 Jul 2001

Workshop

Workshop8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001
CountryGermany
CityWurzburg
Period4/07/016/07/01

Cite this

Zankovych, S., Seekamp, J., Cedeno, C., Sotomayor Torres, C., Ahopelto, J., Pfeiffer, K., ... Wieck, A. (2001). Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting. Paper presented at 8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001, Wurzburg, Germany.
Zankovych, S. ; Seekamp, J. ; Cedeno, C. ; Sotomayor Torres, C. ; Ahopelto, Jouni ; Pfeiffer, K. ; Reuther, D. ; Wieck, A. / Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting. Paper presented at 8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001, Wurzburg, Germany.
@conference{c6b323cdde9a4f8fa03b53bdf22fe609,
title = "Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting",
author = "S. Zankovych and J. Seekamp and C. Cedeno and {Sotomayor Torres}, C. and Jouni Ahopelto and K. Pfeiffer and D. Reuther and A. Wieck",
year = "2001",
language = "English",
note = "8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001 ; Conference date: 04-07-2001 Through 06-07-2001",

}

Zankovych, S, Seekamp, J, Cedeno, C, Sotomayor Torres, C, Ahopelto, J, Pfeiffer, K, Reuther, D & Wieck, A 2001, 'Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting', Paper presented at 8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001, Wurzburg, Germany, 4/07/01 - 6/07/01.

Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting. / Zankovych, S.; Seekamp, J.; Cedeno, C.; Sotomayor Torres, C.; Ahopelto, Jouni; Pfeiffer, K.; Reuther, D.; Wieck, A.

2001. Paper presented at 8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001, Wurzburg, Germany.

Research output: Contribution to conferenceConference articleScientific

TY - CONF

T1 - Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting

AU - Zankovych, S.

AU - Seekamp, J.

AU - Cedeno, C.

AU - Sotomayor Torres, C.

AU - Ahopelto, Jouni

AU - Pfeiffer, K.

AU - Reuther, D.

AU - Wieck, A.

PY - 2001

Y1 - 2001

M3 - Conference article

ER -

Zankovych S, Seekamp J, Cedeno C, Sotomayor Torres C, Ahopelto J, Pfeiffer K et al. Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting. 2001. Paper presented at 8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001, Wurzburg, Germany.