Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting

S. Zankovych, J. Seekamp, C. Cedeno, C. Sotomayor Torres, Jouni Ahopelto, K. Pfeiffer, D. Reuther, A. Wieck

Research output: Contribution to conferenceConference articleScientific

Original languageEnglish
Publication statusPublished - 2001
MoE publication typeNot Eligible
Event8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001 - Wurzburg, Germany
Duration: 4 Jul 20016 Jul 2001

Workshop

Workshop8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001
CountryGermany
CityWurzburg
Period4/07/016/07/01

Cite this

Zankovych, S., Seekamp, J., Cedeno, C., Sotomayor Torres, C., Ahopelto, J., Pfeiffer, K., Reuther, D., & Wieck, A. (2001). Nanoimprinting of a UV- and electron beam sensitive polymer and optical investigation of possible damage by nanoimprinting. Paper presented at 8th MEL-ARI/NID Workshop, Wurzburg, 4 - 6 July 2001, Wurzburg, Germany.