Nanometer to micrometer scale patterning by thermal roll to roll NIL

Tapio Mäkelä

Nanometer to micrometer scale patterning by thermal roll to roll NIL

Research output: Contribution to conference › Conference article › Scientific › peer-review

Abstract

Thermal R2RNIL process is used for various different polymer films and coated substrates. We have used e.g. polymethyl-methacrylate (PMMA), polyethylene terephthalate (PET), CA and polycarbonate (PC) films, conducting polymers, such as polyaniline coated films [4, 5], and very recently nanofiber cellulose films in our experiments. A result indicates that by optimization of the printing parameters linewidths down to 50 nm is possible using R2R process at least with 1:1 aspect ratio. However in many target applications the targeted pattern size will be 500 nm and up to 100 micrometer. These kinds of application are optical lenses on plastic films, backlight/frontlight in displays and microchannels for fluidics. In this presentation several applications will be shown and R2RNIL process suitability for different features will be discussed.

Original language	English
Publication status	Published - 2014
Event	27th International Microprocesses and Nanotechnology Conference, MNC 2014 - Fukuoka, Japan Duration: 4 Nov 2014 → 7 Nov 2014 Conference number: 27

Conference

Conference	27th International Microprocesses and Nanotechnology Conference, MNC 2014
Abbreviated title	MNC 2014
Country/Territory	Japan
City	Fukuoka
Period	4/11/14 → 7/11/14

Keywords

NIL
R2RNIL
roll to roll

Cite this

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title = "Nanometer to micrometer scale patterning by thermal roll to roll NIL",

abstract = "Thermal R2RNIL process is used for various different polymer films and coated substrates. We have used e.g. polymethyl-methacrylate (PMMA), polyethylene terephthalate (PET), CA and polycarbonate (PC) films, conducting polymers, such as polyaniline coated films [4, 5], and very recently nanofiber cellulose films in our experiments. A result indicates that by optimization of the printing parameters linewidths down to 50 nm is possible using R2R process at least with 1:1 aspect ratio. However in many target applications the targeted pattern size will be 500 nm and up to 100 micrometer. These kinds of application are optical lenses on plastic films, backlight/frontlight in displays and microchannels for fluidics. In this presentation several applications will be shown and R2RNIL process suitability for different features will be discussed.",

keywords = "NIL, R2RNIL, roll to roll",

author = "Tapio M{\"a}kel{\"a}",

note = "Project code: 89814; 27th International Microprocesses and Nanotechnology Conference, MNC 2014, MNC 2014 ; Conference date: 04-11-2014 Through 07-11-2014",

year = "2014",

language = "English",

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TY - CONF

T1 - Nanometer to micrometer scale patterning by thermal roll to roll NIL

AU - Mäkelä, Tapio

N1 - Conference code: 27

PY - 2014

Y1 - 2014

N2 - Thermal R2RNIL process is used for various different polymer films and coated substrates. We have used e.g. polymethyl-methacrylate (PMMA), polyethylene terephthalate (PET), CA and polycarbonate (PC) films, conducting polymers, such as polyaniline coated films [4, 5], and very recently nanofiber cellulose films in our experiments. A result indicates that by optimization of the printing parameters linewidths down to 50 nm is possible using R2R process at least with 1:1 aspect ratio. However in many target applications the targeted pattern size will be 500 nm and up to 100 micrometer. These kinds of application are optical lenses on plastic films, backlight/frontlight in displays and microchannels for fluidics. In this presentation several applications will be shown and R2RNIL process suitability for different features will be discussed.

AB - Thermal R2RNIL process is used for various different polymer films and coated substrates. We have used e.g. polymethyl-methacrylate (PMMA), polyethylene terephthalate (PET), CA and polycarbonate (PC) films, conducting polymers, such as polyaniline coated films [4, 5], and very recently nanofiber cellulose films in our experiments. A result indicates that by optimization of the printing parameters linewidths down to 50 nm is possible using R2R process at least with 1:1 aspect ratio. However in many target applications the targeted pattern size will be 500 nm and up to 100 micrometer. These kinds of application are optical lenses on plastic films, backlight/frontlight in displays and microchannels for fluidics. In this presentation several applications will be shown and R2RNIL process suitability for different features will be discussed.

KW - NIL

KW - R2RNIL

KW - roll to roll

M3 - Conference article

T2 - 27th International Microprocesses and Nanotechnology Conference, MNC 2014

Y2 - 4 November 2014 through 7 November 2014

ER -

Nanometer to micrometer scale patterning by thermal roll to roll NIL

Abstract

Conference

Keywords

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