Nanometer to micrometer scale patterning by thermal roll to roll NIL

Research output: Contribution to conferenceConference articleScientificpeer-review

Abstract

Thermal R2RNIL process is used for various different polymer films and coated substrates. We have used e.g. polymethyl-methacrylate (PMMA), polyethylene terephthalate (PET), CA and polycarbonate (PC) films, conducting polymers, such as polyaniline coated films [4, 5], and very recently nanofiber cellulose films in our experiments. A result indicates that by optimization of the printing parameters linewidths down to 50 nm is possible using R2R process at least with 1:1 aspect ratio. However in many target applications the targeted pattern size will be 500 nm and up to 100 micrometer. These kinds of application are optical lenses on plastic films, backlight/frontlight in displays and microchannels for fluidics. In this presentation several applications will be shown and R2RNIL process suitability for different features will be discussed.
Original languageEnglish
Publication statusPublished - 2014
Event27th International Microprocesses and Nanotechnology Conference, MNC 2014 - Fukuoka, Japan
Duration: 4 Nov 20147 Nov 2014
Conference number: 27

Conference

Conference27th International Microprocesses and Nanotechnology Conference, MNC 2014
Abbreviated titleMNC 2014
CountryJapan
CityFukuoka
Period4/11/147/11/14

Keywords

  • NIL
  • R2RNIL
  • roll to roll

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    Mäkelä, T. (2014). Nanometer to micrometer scale patterning by thermal roll to roll NIL. Paper presented at 27th International Microprocesses and Nanotechnology Conference, MNC 2014, Fukuoka, Japan.