Nanostructured TiO2 films deposited by MOCVD on Si-substrates

Ulrika Backman, Ari Auvinen, Jorma Jokiniemi

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Original languageEnglish
    Title of host publicationChemical Vapor Deposition XVI and EUROCVD 14: Proceedings of International symposium
    Subtitle of host publicationParis, France, 27 April - 2 May 2003
    PublisherElectrochemical Society ECS
    ISBN (Print)1-56677-378-4
    Publication statusPublished - 2003
    MoE publication typeA4 Article in a conference publication

    Publication series

    SeriesECS Proceedings Volumes

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