Nanostructured TiO2 films deposited by MOCVD on Si-substrates

Ulrika Backman, Ari Auvinen, Jorma Jokiniemi

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Original languageEnglish
Title of host publicationChemical Vapor Deposition XVI and EUROCVD 14: Proceedings of International symposium
Subtitle of host publicationParis, France, 27 April - 2 May 2003
PublisherElectrochemical Society ECS
Pages1131-1137
ISBN (Print)1-56677-378-4
Publication statusPublished - 2003
MoE publication typeA4 Article in a conference publication

Publication series

SeriesECS Proceedings Volumes
Volume2003-08
ISSN2576-1579

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