Nanostructured TiO2 films deposited by MOCVD on Si-substrates

Ulrika Backman, Ari Auvinen, Jorma Jokiniemi

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Original languageEnglish
Title of host publicationChemical Vapor Deposition XVI and EUROCVD 14: Proceedings of International symposium
Subtitle of host publicationParis, France, 27 April - 2 May 2003
PublisherElectrochemical Society ECS
Pages1131-1137
ISBN (Print)1-56677-378-4
Publication statusPublished - 2003
MoE publication typeA4 Article in a conference publication

Publication series

SeriesECS Proceedings Volumes
Volume2003-08
ISSN2576-1579

Cite this

Backman, U., Auvinen, A., & Jokiniemi, J. (2003). Nanostructured TiO2 films deposited by MOCVD on Si-substrates. In Chemical Vapor Deposition XVI and EUROCVD 14: Proceedings of International symposium: Paris, France, 27 April - 2 May 2003 (pp. 1131-1137). Electrochemical Society ECS. ECS Proceedings Volumes, Vol.. 2003-08