Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate

Jussi Lyytinen (Corresponding Author), Xuwen Liu, Oili M E Ylivaara, Sakari Sintonen, Ajai Iyer, Saima Ali, Jaakko Julin, Harri Lipsanen, Timo Sajavaara, Riikka L. Puurunen, Jari Koskinen

    Research output: Contribution to journalArticleScientificpeer-review

    9 Citations (Scopus)

    Abstract

    For every coating it is critical that the coatings are sufficiently durable to withstand practical applications and that the films adhere well enough to the substrate. In this paper the nanotribological, nanomechanical and interfacial properties of 15-100 nm thick atomic layer deposited (ALD) TiO2 coatings deposited at 110-300 °C were studied using a novel combination of nanoscratch and scanning nanowear testing. Thin film wear increased linearly with increasing scanning nanowear load. The film deposited at 300 °C was up to 58±11 %-points more wear-resistant compared to the films deposited at lower temperatures due to higher hardness and crystallinity of the film. Amorphous/nanocrystalline composite structure with agglomerated crystallites was observed with TiO2 deposited at 200 °C and the agglomerates were up to 37±10 %-points more wear-resistant than the amorphous/nanocrystalline matrix. All of the tested films had excellent interfacial properties and no delamination was observed with the films outside of the scanned regions. These findings may prove useful in the development of tribological and mechanical characterization methods, and in developing thin film materials with enhanced properties tailored to their function. This will also help in the development and tuning of ALD processes.
    Original languageEnglish
    Pages (from-to)270-278
    Number of pages9
    JournalWear
    Volume342-343
    Early online date11 Sep 2015
    DOIs
    Publication statusPublished - 2015
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Silicon
    silicon
    Substrates
    Wear of materials
    coatings
    Coatings
    Scanning
    Thin films
    scanning
    composite structures
    thin films
    Composite structures
    Crystallites
    Delamination
    crystallites
    crystallinity
    hardness
    Tuning
    Hardness
    tuning

    Keywords

    • Atomic layer deposition
    • Interfacial characterization
    • Nanomechanical characterization
    • Nanoscratch
    • Nanotribology
    • Scanning nanowear

    Cite this

    Lyytinen, Jussi ; Liu, Xuwen ; Ylivaara, Oili M E ; Sintonen, Sakari ; Iyer, Ajai ; Ali, Saima ; Julin, Jaakko ; Lipsanen, Harri ; Sajavaara, Timo ; Puurunen, Riikka L. ; Koskinen, Jari. / Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate. In: Wear. 2015 ; Vol. 342-343. pp. 270-278.
    @article{d04acbdf425d4869811df1b533100bdc,
    title = "Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate",
    abstract = "For every coating it is critical that the coatings are sufficiently durable to withstand practical applications and that the films adhere well enough to the substrate. In this paper the nanotribological, nanomechanical and interfacial properties of 15-100 nm thick atomic layer deposited (ALD) TiO2 coatings deposited at 110-300 °C were studied using a novel combination of nanoscratch and scanning nanowear testing. Thin film wear increased linearly with increasing scanning nanowear load. The film deposited at 300 °C was up to 58±11 {\%}-points more wear-resistant compared to the films deposited at lower temperatures due to higher hardness and crystallinity of the film. Amorphous/nanocrystalline composite structure with agglomerated crystallites was observed with TiO2 deposited at 200 °C and the agglomerates were up to 37±10 {\%}-points more wear-resistant than the amorphous/nanocrystalline matrix. All of the tested films had excellent interfacial properties and no delamination was observed with the films outside of the scanned regions. These findings may prove useful in the development of tribological and mechanical characterization methods, and in developing thin film materials with enhanced properties tailored to their function. This will also help in the development and tuning of ALD processes.",
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    author = "Jussi Lyytinen and Xuwen Liu and Ylivaara, {Oili M E} and Sakari Sintonen and Ajai Iyer and Saima Ali and Jaakko Julin and Harri Lipsanen and Timo Sajavaara and Puurunen, {Riikka L.} and Jari Koskinen",
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    language = "English",
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    Lyytinen, J, Liu, X, Ylivaara, OME, Sintonen, S, Iyer, A, Ali, S, Julin, J, Lipsanen, H, Sajavaara, T, Puurunen, RL & Koskinen, J 2015, 'Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate', Wear, vol. 342-343, pp. 270-278. https://doi.org/10.1016/j.wear.2015.09.001

    Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate. / Lyytinen, Jussi (Corresponding Author); Liu, Xuwen; Ylivaara, Oili M E; Sintonen, Sakari; Iyer, Ajai; Ali, Saima; Julin, Jaakko; Lipsanen, Harri; Sajavaara, Timo; Puurunen, Riikka L.; Koskinen, Jari.

    In: Wear, Vol. 342-343, 2015, p. 270-278.

    Research output: Contribution to journalArticleScientificpeer-review

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    T1 - Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate

    AU - Lyytinen, Jussi

    AU - Liu, Xuwen

    AU - Ylivaara, Oili M E

    AU - Sintonen, Sakari

    AU - Iyer, Ajai

    AU - Ali, Saima

    AU - Julin, Jaakko

    AU - Lipsanen, Harri

    AU - Sajavaara, Timo

    AU - Puurunen, Riikka L.

    AU - Koskinen, Jari

    N1 - Project 74717 MECHALD

    PY - 2015

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    N2 - For every coating it is critical that the coatings are sufficiently durable to withstand practical applications and that the films adhere well enough to the substrate. In this paper the nanotribological, nanomechanical and interfacial properties of 15-100 nm thick atomic layer deposited (ALD) TiO2 coatings deposited at 110-300 °C were studied using a novel combination of nanoscratch and scanning nanowear testing. Thin film wear increased linearly with increasing scanning nanowear load. The film deposited at 300 °C was up to 58±11 %-points more wear-resistant compared to the films deposited at lower temperatures due to higher hardness and crystallinity of the film. Amorphous/nanocrystalline composite structure with agglomerated crystallites was observed with TiO2 deposited at 200 °C and the agglomerates were up to 37±10 %-points more wear-resistant than the amorphous/nanocrystalline matrix. All of the tested films had excellent interfacial properties and no delamination was observed with the films outside of the scanned regions. These findings may prove useful in the development of tribological and mechanical characterization methods, and in developing thin film materials with enhanced properties tailored to their function. This will also help in the development and tuning of ALD processes.

    AB - For every coating it is critical that the coatings are sufficiently durable to withstand practical applications and that the films adhere well enough to the substrate. In this paper the nanotribological, nanomechanical and interfacial properties of 15-100 nm thick atomic layer deposited (ALD) TiO2 coatings deposited at 110-300 °C were studied using a novel combination of nanoscratch and scanning nanowear testing. Thin film wear increased linearly with increasing scanning nanowear load. The film deposited at 300 °C was up to 58±11 %-points more wear-resistant compared to the films deposited at lower temperatures due to higher hardness and crystallinity of the film. Amorphous/nanocrystalline composite structure with agglomerated crystallites was observed with TiO2 deposited at 200 °C and the agglomerates were up to 37±10 %-points more wear-resistant than the amorphous/nanocrystalline matrix. All of the tested films had excellent interfacial properties and no delamination was observed with the films outside of the scanned regions. These findings may prove useful in the development of tribological and mechanical characterization methods, and in developing thin film materials with enhanced properties tailored to their function. This will also help in the development and tuning of ALD processes.

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    KW - Interfacial characterization

    KW - Nanomechanical characterization

    KW - Nanoscratch

    KW - Nanotribology

    KW - Scanning nanowear

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