Abstract
A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 μC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 μm.
Original language | English |
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Pages (from-to) | 185-187 |
Journal | Thin Solid Films |
Volume | 345 |
Issue number | 2 |
DOIs | |
Publication status | Published - 1999 |
MoE publication type | A1 Journal article-refereed |