Negative tone hybrid sol-gel material for electron-beam lithography

Juha Rantala (Corresponding Author), R. Penner, Jouko Vähäkangas, Seppo Honkanen, M. Fallahi, Nasser Peyghambarian

Research output: Contribution to journalArticleScientificpeer-review

16 Citations (Scopus)

Abstract

A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 μC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 μm.
Original languageEnglish
Pages (from-to)185-187
Number of pages3
JournalThin Solid Films
Volume345
Issue number2
DOIs
Publication statusPublished - 1999
MoE publication typeA1 Journal article-refereed

Fingerprint

Electron beam lithography
Sol-gels
lithography
gels
electron beams
Optical devices
Linewidth
Contrast Media
gratings
Fabrication
Glass
dosage
fabrication
glass
sensitivity
high resolution

Cite this

Rantala, J., Penner, R., Vähäkangas, J., Honkanen, S., Fallahi, M., & Peyghambarian, N. (1999). Negative tone hybrid sol-gel material for electron-beam lithography. Thin Solid Films, 345(2), 185-187. https://doi.org/10.1016/S0040-6090(98)01365-0
Rantala, Juha ; Penner, R. ; Vähäkangas, Jouko ; Honkanen, Seppo ; Fallahi, M. ; Peyghambarian, Nasser. / Negative tone hybrid sol-gel material for electron-beam lithography. In: Thin Solid Films. 1999 ; Vol. 345, No. 2. pp. 185-187.
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Rantala, J, Penner, R, Vähäkangas, J, Honkanen, S, Fallahi, M & Peyghambarian, N 1999, 'Negative tone hybrid sol-gel material for electron-beam lithography', Thin Solid Films, vol. 345, no. 2, pp. 185-187. https://doi.org/10.1016/S0040-6090(98)01365-0

Negative tone hybrid sol-gel material for electron-beam lithography. / Rantala, Juha (Corresponding Author); Penner, R.; Vähäkangas, Jouko; Honkanen, Seppo; Fallahi, M.; Peyghambarian, Nasser.

In: Thin Solid Films, Vol. 345, No. 2, 1999, p. 185-187.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Rantala, Juha

AU - Penner, R.

AU - Vähäkangas, Jouko

AU - Honkanen, Seppo

AU - Fallahi, M.

AU - Peyghambarian, Nasser

PY - 1999

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AB - A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 μC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 μm.

U2 - 10.1016/S0040-6090(98)01365-0

DO - 10.1016/S0040-6090(98)01365-0

M3 - Article

VL - 345

SP - 185

EP - 187

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

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Rantala J, Penner R, Vähäkangas J, Honkanen S, Fallahi M, Peyghambarian N. Negative tone hybrid sol-gel material for electron-beam lithography. Thin Solid Films. 1999;345(2):185-187. https://doi.org/10.1016/S0040-6090(98)01365-0