Negative tone hybrid sol-gel material for electron-beam lithography

Juha Rantala (Corresponding Author), R.S. Penner, Seppo Honkanen, Jouko Vähäkangas, M. Fallahi, Nasser Peyghambarian

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16 Citations (Scopus)

Abstract

A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 μC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 μm.
Original languageEnglish
Pages (from-to)185-187
JournalThin Solid Films
Volume345
Issue number2
DOIs
Publication statusPublished - 1999
MoE publication typeA1 Journal article-refereed

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  • Cite this

    Rantala, J., Penner, R. S., Honkanen, S., Vähäkangas, J., Fallahi, M., & Peyghambarian, N. (1999). Negative tone hybrid sol-gel material for electron-beam lithography. Thin Solid Films, 345(2), 185-187. https://doi.org/10.1016/S0040-6090(98)01365-0