Negative tone hybrid sol-gel material for electron-beam lithography

Juha Rantala (Corresponding Author), R.S. Penner, Seppo Honkanen, Jouko Vähäkangas, M. Fallahi, Nasser Peyghambarian

Research output: Contribution to journalArticleScientificpeer-review

17 Citations (Scopus)


A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 μC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 μm.
Original languageEnglish
Pages (from-to)185-187
JournalThin Solid Films
Issue number2
Publication statusPublished - 1999
MoE publication typeA1 Journal article-refereed


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