Negative tone hybrid sol-gel material for electron-beam lithography

Juha Rantala; R.S. Penner; Seppo Honkanen; Jouko Vähäkangas; M. Fallahi; Nasser Peyghambarian

doi:10.1016/S0040-6090(98)01365-0

Negative tone hybrid sol-gel material for electron-beam lithography

Juha Rantala^*
, R.S. Penner
, Seppo Honkanen
, Jouko Vähäkangas
, M. Fallahi
, Nasser Peyghambarian

^*Corresponding author for this work

VTT Technical Research Centre of Finland

Research output: Contribution to journal › Article › Scientific › peer-review

17 Citations (Scopus)

Abstract

A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 µC/cm² were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 µm.

Original language	English
Pages (from-to)	185-187
Journal	Thin Solid Films
Volume	345
Issue number	2
DOIs	https://doi.org/10.1016/S0040-6090(98)01365-0
Publication status	Published - 1999
MoE publication type	A1 Journal article-refereed

Access to Document

10.1016/S0040-6090(98)01365-0

Cite this

@article{f48342886ff04ba087b6a9c7302c66cf,

title = "Negative tone hybrid sol-gel material for electron-beam lithography",

abstract = "A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 µC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 µm.",

author = "Juha Rantala and R.S. Penner and Seppo Honkanen and Jouko V{\"a}h{\"a}kangas and M. Fallahi and Nasser Peyghambarian",

year = "1999",

doi = "10.1016/S0040-6090(98)01365-0",

language = "English",

volume = "345",

pages = "185--187",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "2",

}

TY - JOUR

T1 - Negative tone hybrid sol-gel material for electron-beam lithography

AU - Rantala, Juha

AU - Penner, R.S.

AU - Honkanen, Seppo

AU - Vähäkangas, Jouko

AU - Fallahi, M.

AU - Peyghambarian, Nasser

PY - 1999

Y1 - 1999

N2 - A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 µC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 µm.

AB - A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 µC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 µm.

U2 - 10.1016/S0040-6090(98)01365-0

DO - 10.1016/S0040-6090(98)01365-0

M3 - Article

SN - 0040-6090

VL - 345

SP - 185

EP - 187

JO - Thin Solid Films

JF - Thin Solid Films

IS - 2

ER -

Negative tone hybrid sol-gel material for electron-beam lithography

Abstract

Access to Document

Fingerprint

Cite this