New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing

Jyrki Molarius, Martin Kulawski, Tuomas Pensala, Markku Ylilammi

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

2 Citations (Scopus)

Abstract

The main application of FBAR (thin film bulk acoustic wave resonator) is in telecommunications. These new FBAR filters with their light weight and small size will replace the currently used bulky ceramic filters in mobile telephone handsets. FBAR filters show promise to be even smaller and have higher performance than SAW (surface acoustic wave) filters. Two different approaches of FBAR filters are reviewed and compared; bridge type technology and acoustic mirror based technology. The idea of using CMP (chemical mechanical polishing) smoothening to improve the quality of FBAR will be presented as well as the preliminary results achieved.
Original languageEnglish
Title of host publicationThe Nano-Micro Interface
Subtitle of host publicationBridging the Micro and Nano Worlds
EditorsHans-Jörg Fetch, Matthias Werner
Place of PublicationWeinheim
Chapter14
Pages181-193
ISBN (Electronic)978-3-527-60411-1
DOIs
Publication statusPublished - 2004
MoE publication typeA3 Part of a book or another research book

Fingerprint

Polishing
Resonators
Acoustic waves
Thin films
Acoustic surface wave filters
Telephone sets
Chemical mechanical polishing
Telephone
Telecommunication
Mirrors
Acoustics

Cite this

Molarius, J., Kulawski, M., Pensala, T., & Ylilammi, M. (2004). New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. In H-J. Fetch, & M. Werner (Eds.), The Nano-Micro Interface: Bridging the Micro and Nano Worlds (pp. 181-193). Weinheim. https://doi.org/10.1002/3527604111.ch14
Molarius, Jyrki ; Kulawski, Martin ; Pensala, Tuomas ; Ylilammi, Markku. / New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. The Nano-Micro Interface: Bridging the Micro and Nano Worlds. editor / Hans-Jörg Fetch ; Matthias Werner. Weinheim, 2004. pp. 181-193
@inbook{67bbea8a59d34a5a8a4e52c9b5f4fdb8,
title = "New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing",
abstract = "The main application of FBAR (thin film bulk acoustic wave resonator) is in telecommunications. These new FBAR filters with their light weight and small size will replace the currently used bulky ceramic filters in mobile telephone handsets. FBAR filters show promise to be even smaller and have higher performance than SAW (surface acoustic wave) filters. Two different approaches of FBAR filters are reviewed and compared; bridge type technology and acoustic mirror based technology. The idea of using CMP (chemical mechanical polishing) smoothening to improve the quality of FBAR will be presented as well as the preliminary results achieved.",
author = "Jyrki Molarius and Martin Kulawski and Tuomas Pensala and Markku Ylilammi",
note = "Project code: T2SU00140",
year = "2004",
doi = "10.1002/3527604111.ch14",
language = "English",
isbn = "978-3-527-30978-8",
pages = "181--193",
editor = "Hans-J{\"o}rg Fetch and Matthias Werner",
booktitle = "The Nano-Micro Interface",

}

Molarius, J, Kulawski, M, Pensala, T & Ylilammi, M 2004, New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. in H-J Fetch & M Werner (eds), The Nano-Micro Interface: Bridging the Micro and Nano Worlds. Weinheim, pp. 181-193. https://doi.org/10.1002/3527604111.ch14

New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. / Molarius, Jyrki; Kulawski, Martin; Pensala, Tuomas; Ylilammi, Markku.

The Nano-Micro Interface: Bridging the Micro and Nano Worlds. ed. / Hans-Jörg Fetch; Matthias Werner. Weinheim, 2004. p. 181-193.

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

TY - CHAP

T1 - New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing

AU - Molarius, Jyrki

AU - Kulawski, Martin

AU - Pensala, Tuomas

AU - Ylilammi, Markku

N1 - Project code: T2SU00140

PY - 2004

Y1 - 2004

N2 - The main application of FBAR (thin film bulk acoustic wave resonator) is in telecommunications. These new FBAR filters with their light weight and small size will replace the currently used bulky ceramic filters in mobile telephone handsets. FBAR filters show promise to be even smaller and have higher performance than SAW (surface acoustic wave) filters. Two different approaches of FBAR filters are reviewed and compared; bridge type technology and acoustic mirror based technology. The idea of using CMP (chemical mechanical polishing) smoothening to improve the quality of FBAR will be presented as well as the preliminary results achieved.

AB - The main application of FBAR (thin film bulk acoustic wave resonator) is in telecommunications. These new FBAR filters with their light weight and small size will replace the currently used bulky ceramic filters in mobile telephone handsets. FBAR filters show promise to be even smaller and have higher performance than SAW (surface acoustic wave) filters. Two different approaches of FBAR filters are reviewed and compared; bridge type technology and acoustic mirror based technology. The idea of using CMP (chemical mechanical polishing) smoothening to improve the quality of FBAR will be presented as well as the preliminary results achieved.

U2 - 10.1002/3527604111.ch14

DO - 10.1002/3527604111.ch14

M3 - Chapter or book article

SN - 978-3-527-30978-8

SP - 181

EP - 193

BT - The Nano-Micro Interface

A2 - Fetch, Hans-Jörg

A2 - Werner, Matthias

CY - Weinheim

ER -

Molarius J, Kulawski M, Pensala T, Ylilammi M. New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. In Fetch H-J, Werner M, editors, The Nano-Micro Interface: Bridging the Micro and Nano Worlds. Weinheim. 2004. p. 181-193 https://doi.org/10.1002/3527604111.ch14