New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing

Jyrki Molarius, Martin Kulawski, Tuomas Pensala, Markku Ylilammi

    Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

    2 Citations (Scopus)

    Abstract

    The main application of FBAR (thin film bulk acoustic wave resonator) is in telecommunications. These new FBAR filters with their light weight and small size will replace the currently used bulky ceramic filters in mobile telephone handsets. FBAR filters show promise to be even smaller and have higher performance than SAW (surface acoustic wave) filters. Two different approaches of FBAR filters are reviewed and compared; bridge type technology and acoustic mirror based technology. The idea of using CMP (chemical mechanical polishing) smoothening to improve the quality of FBAR will be presented as well as the preliminary results achieved.
    Original languageEnglish
    Title of host publicationThe Nano-Micro Interface
    Subtitle of host publicationBridging the Micro and Nano Worlds
    EditorsHans-Jörg Fetch, Matthias Werner
    Place of PublicationWeinheim
    Chapter14
    Pages181-193
    ISBN (Electronic)978-3-527-60411-1
    DOIs
    Publication statusPublished - 2004
    MoE publication typeA3 Part of a book or another research book

    Fingerprint

    Polishing
    Resonators
    Acoustic waves
    Thin films
    Acoustic surface wave filters
    Telephone sets
    Chemical mechanical polishing
    Telephone
    Telecommunication
    Mirrors
    Acoustics

    Cite this

    Molarius, J., Kulawski, M., Pensala, T., & Ylilammi, M. (2004). New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. In H-J. Fetch, & M. Werner (Eds.), The Nano-Micro Interface: Bridging the Micro and Nano Worlds (pp. 181-193). Weinheim. https://doi.org/10.1002/3527604111.ch14
    Molarius, Jyrki ; Kulawski, Martin ; Pensala, Tuomas ; Ylilammi, Markku. / New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. The Nano-Micro Interface: Bridging the Micro and Nano Worlds. editor / Hans-Jörg Fetch ; Matthias Werner. Weinheim, 2004. pp. 181-193
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    abstract = "The main application of FBAR (thin film bulk acoustic wave resonator) is in telecommunications. These new FBAR filters with their light weight and small size will replace the currently used bulky ceramic filters in mobile telephone handsets. FBAR filters show promise to be even smaller and have higher performance than SAW (surface acoustic wave) filters. Two different approaches of FBAR filters are reviewed and compared; bridge type technology and acoustic mirror based technology. The idea of using CMP (chemical mechanical polishing) smoothening to improve the quality of FBAR will be presented as well as the preliminary results achieved.",
    author = "Jyrki Molarius and Martin Kulawski and Tuomas Pensala and Markku Ylilammi",
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    Molarius, J, Kulawski, M, Pensala, T & Ylilammi, M 2004, New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. in H-J Fetch & M Werner (eds), The Nano-Micro Interface: Bridging the Micro and Nano Worlds. Weinheim, pp. 181-193. https://doi.org/10.1002/3527604111.ch14

    New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. / Molarius, Jyrki; Kulawski, Martin; Pensala, Tuomas; Ylilammi, Markku.

    The Nano-Micro Interface: Bridging the Micro and Nano Worlds. ed. / Hans-Jörg Fetch; Matthias Werner. Weinheim, 2004. p. 181-193.

    Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

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    T1 - New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing

    AU - Molarius, Jyrki

    AU - Kulawski, Martin

    AU - Pensala, Tuomas

    AU - Ylilammi, Markku

    N1 - Project code: T2SU00140

    PY - 2004

    Y1 - 2004

    N2 - The main application of FBAR (thin film bulk acoustic wave resonator) is in telecommunications. These new FBAR filters with their light weight and small size will replace the currently used bulky ceramic filters in mobile telephone handsets. FBAR filters show promise to be even smaller and have higher performance than SAW (surface acoustic wave) filters. Two different approaches of FBAR filters are reviewed and compared; bridge type technology and acoustic mirror based technology. The idea of using CMP (chemical mechanical polishing) smoothening to improve the quality of FBAR will be presented as well as the preliminary results achieved.

    AB - The main application of FBAR (thin film bulk acoustic wave resonator) is in telecommunications. These new FBAR filters with their light weight and small size will replace the currently used bulky ceramic filters in mobile telephone handsets. FBAR filters show promise to be even smaller and have higher performance than SAW (surface acoustic wave) filters. Two different approaches of FBAR filters are reviewed and compared; bridge type technology and acoustic mirror based technology. The idea of using CMP (chemical mechanical polishing) smoothening to improve the quality of FBAR will be presented as well as the preliminary results achieved.

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    DO - 10.1002/3527604111.ch14

    M3 - Chapter or book article

    SN - 978-3-527-30978-8

    SP - 181

    EP - 193

    BT - The Nano-Micro Interface

    A2 - Fetch, Hans-Jörg

    A2 - Werner, Matthias

    CY - Weinheim

    ER -

    Molarius J, Kulawski M, Pensala T, Ylilammi M. New approach to improve the piezoelectric quality of ZnO resonator by chemomechanical polishing. In Fetch H-J, Werner M, editors, The Nano-Micro Interface: Bridging the Micro and Nano Worlds. Weinheim. 2004. p. 181-193 https://doi.org/10.1002/3527604111.ch14