New polymer materials for nanoimprinting

H. Schulz; H.-C. Scheer; T. Hoffmann; C. Sotomayor-Torres; Karl Pfeiffer; G. Bleidiessel; G. Grutzner; C. Cardinaud; F. Gaboriau; M.-C. Peignon; Jouni Ahopelto; B. Heidari

doi:10.1116/1.1305331

New polymer materials for nanoimprinting

H. Schulz, H.-C. Scheer, T. Hoffmann, C. Sotomayor-Torres, Karl Pfeiffer, G. Bleidiessel, G. Grutzner, C. Cardinaud, F. Gaboriau, M.-C. Peignon, Jouni Ahopelto, B. Heidari

Research output: Contribution to journal › Article › Scientific › peer-review

73 Citations (Scopus)

Abstract

We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO₂ patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.

Original language	English
Pages (from-to)	1861 - 1865
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	18
Issue number	4
DOIs	https://doi.org/10.1116/1.1305331
Publication status	Published - 2000
MoE publication type	A1 Journal article-refereed

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Schulz, H., Scheer, H.-C., Hoffmann, T., Sotomayor-Torres, C., Pfeiffer, K., Bleidiessel, G., Grutzner, G., Cardinaud, C., Gaboriau, F., Peignon, M.-C., Ahopelto, J., & Heidari, B. (2000). New polymer materials for nanoimprinting. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18(4), 1861 - 1865. https://doi.org/10.1116/1.1305331

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title = "New polymer materials for nanoimprinting",

abstract = "We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.",

author = "H. Schulz and H.-C. Scheer and T. Hoffmann and C. Sotomayor-Torres and Karl Pfeiffer and G. Bleidiessel and G. Grutzner and C. Cardinaud and F. Gaboriau and M.-C. Peignon and Jouni Ahopelto and B. Heidari",

year = "2000",

doi = "10.1116/1.1305331",

language = "English",

volume = "18",

pages = "1861 -- 1865",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

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TY - JOUR

T1 - New polymer materials for nanoimprinting

AU - Schulz, H.

AU - Scheer, H.-C.

AU - Hoffmann, T.

AU - Sotomayor-Torres, C.

AU - Pfeiffer, Karl

AU - Bleidiessel, G.

AU - Grutzner, G.

AU - Cardinaud, C.

AU - Gaboriau, F.

AU - Peignon, M.-C.

AU - Ahopelto, Jouni

AU - Heidari, B.

PY - 2000

Y1 - 2000

N2 - We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.

AB - We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.

U2 - 10.1116/1.1305331

DO - 10.1116/1.1305331

M3 - Article

SN - 1071-1023

VL - 18

SP - 1861

EP - 1865

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 4

ER -

New polymer materials for nanoimprinting

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