New polymer materials for nanoimprinting

H. Schulz, H.-C. Scheer, T. Hoffmann, C. Sotomayor-Torres, Karl Pfeiffer, G. Bleidiessel, G. Grutzner, C. Cardinaud, F. Gaboriau, M.-C. Peignon, Jouni Ahopelto, B. Heidari

    Research output: Contribution to journalArticleScientificpeer-review

    68 Citations (Scopus)

    Abstract

    We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.
    Original languageEnglish
    Pages (from-to)1861 - 1865
    Number of pages5
    JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
    Volume18
    Issue number4
    DOIs
    Publication statusPublished - 2000
    MoE publication typeA1 Journal article-refereed

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    Thermosets
    Thermoplastics
    Aromatic polymers
    Dry etching
    Plasma density
    Polymers
    Polytetrafluoroethylenes

    Cite this

    Schulz, H., Scheer, H-C., Hoffmann, T., Sotomayor-Torres, C., Pfeiffer, K., Bleidiessel, G., ... Heidari, B. (2000). New polymer materials for nanoimprinting. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18(4), 1861 - 1865. https://doi.org/10.1116/1.1305331
    Schulz, H. ; Scheer, H.-C. ; Hoffmann, T. ; Sotomayor-Torres, C. ; Pfeiffer, Karl ; Bleidiessel, G. ; Grutzner, G. ; Cardinaud, C. ; Gaboriau, F. ; Peignon, M.-C. ; Ahopelto, Jouni ; Heidari, B. / New polymer materials for nanoimprinting. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2000 ; Vol. 18, No. 4. pp. 1861 - 1865.
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    title = "New polymer materials for nanoimprinting",
    abstract = "We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.",
    author = "H. Schulz and H.-C. Scheer and T. Hoffmann and C. Sotomayor-Torres and Karl Pfeiffer and G. Bleidiessel and G. Grutzner and C. Cardinaud and F. Gaboriau and M.-C. Peignon and Jouni Ahopelto and B. Heidari",
    year = "2000",
    doi = "10.1116/1.1305331",
    language = "English",
    volume = "18",
    pages = "1861 -- 1865",
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    Schulz, H, Scheer, H-C, Hoffmann, T, Sotomayor-Torres, C, Pfeiffer, K, Bleidiessel, G, Grutzner, G, Cardinaud, C, Gaboriau, F, Peignon, M-C, Ahopelto, J & Heidari, B 2000, 'New polymer materials for nanoimprinting', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 18, no. 4, pp. 1861 - 1865. https://doi.org/10.1116/1.1305331

    New polymer materials for nanoimprinting. / Schulz, H.; Scheer, H.-C.; Hoffmann, T.; Sotomayor-Torres, C.; Pfeiffer, Karl; Bleidiessel, G.; Grutzner, G.; Cardinaud, C.; Gaboriau, F.; Peignon, M.-C.; Ahopelto, Jouni; Heidari, B.

    In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 18, No. 4, 2000, p. 1861 - 1865.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - New polymer materials for nanoimprinting

    AU - Schulz, H.

    AU - Scheer, H.-C.

    AU - Hoffmann, T.

    AU - Sotomayor-Torres, C.

    AU - Pfeiffer, Karl

    AU - Bleidiessel, G.

    AU - Grutzner, G.

    AU - Cardinaud, C.

    AU - Gaboriau, F.

    AU - Peignon, M.-C.

    AU - Ahopelto, Jouni

    AU - Heidari, B.

    PY - 2000

    Y1 - 2000

    N2 - We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.

    AB - We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.

    U2 - 10.1116/1.1305331

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    M3 - Article

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    SP - 1861

    EP - 1865

    JO - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

    JF - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

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    Schulz H, Scheer H-C, Hoffmann T, Sotomayor-Torres C, Pfeiffer K, Bleidiessel G et al. New polymer materials for nanoimprinting. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2000;18(4):1861 - 1865. https://doi.org/10.1116/1.1305331