New polymer materials for nanoimprinting

H. Schulz, H.-C. Scheer, T. Hoffmann, C. Sotomayor-Torres, Karl Pfeiffer, G. Bleidiessel, G. Grutzner, C. Cardinaud, F. Gaboriau, M.-C. Peignon, Jouni Ahopelto, B. Heidari

    Research output: Contribution to journalArticleScientificpeer-review

    73 Citations (Scopus)


    We have investigated new aromatic polymers for nanoimprint and subsequent dry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density conditions and feature a selectivity about twice as high as poly(methylmethacrylate) (PMMA). The imprint behavior is comparable to PMMA and, in particular, the thermoplastic polymers show excellent imprint quality. This was demonstrated by replication of large arrays of lines down to 50 nm width. The thermoset polymers showed excellent dry etch stability and Teflon-like antisticking layers helped to imprint them without sticking.
    Original languageEnglish
    Pages (from-to)1861 - 1865
    Number of pages5
    JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
    Issue number4
    Publication statusPublished - 2000
    MoE publication typeA1 Journal article-refereed


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