Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

Nadine M.P. Guillaume; Richard A. Allen; Markku Lahti; Loren W. Linholm; Michael W. Cresswell; Mona E. Zaghloul

doi:10.1109/TSM.2003.822736

Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

Nadine M.P. Guillaume, Richard A. Allen, Markku Lahti, Loren W. Linholm, Michael W. Cresswell, Mona E. Zaghloul

Research output: Contribution to journal › Article › Scientific › peer-review

2 Citations (Scopus)

Abstract

This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.

Original language	English
Pages (from-to)	25 - 34
Number of pages	10
Journal	IEEE Transactions on Semiconductor Manufacturing
Volume	17
Issue number	1
DOIs	https://doi.org/10.1109/TSM.2003.822736
Publication status	Published - 2004
MoE publication type	A1 Journal article-refereed

Keywords

critical dimensions
linewidth
low temperature co-fired ceramic
LTCC
noncontact capacitive sensor
photomask metrology
metrology
metrology sensors
sensors
optical lithography

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title = "Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology",

abstract = "This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.",

keywords = "critical dimensions, linewidth, low temperature co-fired ceramic, LTCC, noncontact capacitive sensor, photomask metrology, metrology, metrology sensors, sensors, optical lithography",

author = "Guillaume, {Nadine M.P.} and Allen, {Richard A.} and Markku Lahti and Linholm, {Loren W.} and Cresswell, {Michael W.} and Zaghloul, {Mona E.}",

year = "2004",

doi = "10.1109/TSM.2003.822736",

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volume = "17",

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journal = "IEEE Transactions on Semiconductor Manufacturing",

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T1 - Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

AU - Guillaume, Nadine M.P.

AU - Allen, Richard A.

AU - Lahti, Markku

AU - Linholm, Loren W.

AU - Cresswell, Michael W.

AU - Zaghloul, Mona E.

PY - 2004

Y1 - 2004

N2 - This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.

AB - This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.

KW - critical dimensions

KW - linewidth

KW - low temperature co-fired ceramic

KW - LTCC

KW - noncontact capacitive sensor

KW - photomask metrology

KW - metrology

KW - metrology sensors

KW - sensors

KW - optical lithography

U2 - 10.1109/TSM.2003.822736

DO - 10.1109/TSM.2003.822736

M3 - Article

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EP - 34

JO - IEEE Transactions on Semiconductor Manufacturing

JF - IEEE Transactions on Semiconductor Manufacturing

IS - 1

ER -

Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

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Keywords

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