Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

Nadine M.P. Guillaume, Richard A. Allen, Markku Lahti, Loren W. Linholm, Michael W. Cresswell, Mona E. Zaghloul

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)

Abstract

This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.
Original languageEnglish
Pages (from-to)25 - 34
Number of pages10
JournalIEEE Transactions on Semiconductor Manufacturing
Volume17
Issue number1
DOIs
Publication statusPublished - 2004
MoE publication typeA1 Journal article-refereed

Fingerprint

Photomasks
photomasks
metrology
chromium
ceramics
sensors
Sensors
Semiconductor device manufacture
reticles
Capacitive sensors
Temperature
semiconductor devices
Linewidth
Glass
glass

Keywords

  • critical dimensions
  • linewidth
  • low temperature co-fired ceramic
  • LTCC
  • noncontact capacitive sensor
  • photomask metrology
  • metrology
  • metrology sensors
  • sensors
  • optical lithography

Cite this

Guillaume, Nadine M.P. ; Allen, Richard A. ; Lahti, Markku ; Linholm, Loren W. ; Cresswell, Michael W. ; Zaghloul, Mona E. / Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology. In: IEEE Transactions on Semiconductor Manufacturing. 2004 ; Vol. 17, No. 1. pp. 25 - 34.
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keywords = "critical dimensions, linewidth, low temperature co-fired ceramic, LTCC, noncontact capacitive sensor, photomask metrology, metrology, metrology sensors, sensors, optical lithography",
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Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology. / Guillaume, Nadine M.P.; Allen, Richard A.; Lahti, Markku; Linholm, Loren W.; Cresswell, Michael W.; Zaghloul, Mona E.

In: IEEE Transactions on Semiconductor Manufacturing, Vol. 17, No. 1, 2004, p. 25 - 34.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Guillaume, Nadine M.P.

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AU - Cresswell, Michael W.

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AB - This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.

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KW - optical lithography

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