Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

Nadine M.P. Guillaume, Richard A. Allen, Markku Lahti, Loren W. Linholm, Michael W. Cresswell, Mona E. Zaghloul

    Research output: Contribution to journalArticleScientificpeer-review

    2 Citations (Scopus)

    Abstract

    This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.
    Original languageEnglish
    Pages (from-to)25 - 34
    Number of pages10
    JournalIEEE Transactions on Semiconductor Manufacturing
    Volume17
    Issue number1
    DOIs
    Publication statusPublished - 2004
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Photomasks
    photomasks
    metrology
    chromium
    ceramics
    sensors
    Sensors
    Semiconductor device manufacture
    reticles
    Capacitive sensors
    Temperature
    semiconductor devices
    Linewidth
    Glass
    glass

    Keywords

    • critical dimensions
    • linewidth
    • low temperature co-fired ceramic
    • LTCC
    • noncontact capacitive sensor
    • photomask metrology
    • metrology
    • metrology sensors
    • sensors
    • optical lithography

    Cite this

    Guillaume, Nadine M.P. ; Allen, Richard A. ; Lahti, Markku ; Linholm, Loren W. ; Cresswell, Michael W. ; Zaghloul, Mona E. / Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology. In: IEEE Transactions on Semiconductor Manufacturing. 2004 ; Vol. 17, No. 1. pp. 25 - 34.
    @article{aaaee19c85244d1f832d7df57a3182d1,
    title = "Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology",
    abstract = "This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.",
    keywords = "critical dimensions, linewidth, low temperature co-fired ceramic, LTCC, noncontact capacitive sensor, photomask metrology, metrology, metrology sensors, sensors, optical lithography",
    author = "Guillaume, {Nadine M.P.} and Allen, {Richard A.} and Markku Lahti and Linholm, {Loren W.} and Cresswell, {Michael W.} and Zaghloul, {Mona E.}",
    year = "2004",
    doi = "10.1109/TSM.2003.822736",
    language = "English",
    volume = "17",
    pages = "25 -- 34",
    journal = "IEEE Transactions on Semiconductor Manufacturing",
    issn = "0894-6507",
    publisher = "IEEE Institute of Electrical and Electronic Engineers",
    number = "1",

    }

    Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology. / Guillaume, Nadine M.P.; Allen, Richard A.; Lahti, Markku; Linholm, Loren W.; Cresswell, Michael W.; Zaghloul, Mona E.

    In: IEEE Transactions on Semiconductor Manufacturing, Vol. 17, No. 1, 2004, p. 25 - 34.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

    AU - Guillaume, Nadine M.P.

    AU - Allen, Richard A.

    AU - Lahti, Markku

    AU - Linholm, Loren W.

    AU - Cresswell, Michael W.

    AU - Zaghloul, Mona E.

    PY - 2004

    Y1 - 2004

    N2 - This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.

    AB - This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.

    KW - critical dimensions

    KW - linewidth

    KW - low temperature co-fired ceramic

    KW - LTCC

    KW - noncontact capacitive sensor

    KW - photomask metrology

    KW - metrology

    KW - metrology sensors

    KW - sensors

    KW - optical lithography

    U2 - 10.1109/TSM.2003.822736

    DO - 10.1109/TSM.2003.822736

    M3 - Article

    VL - 17

    SP - 25

    EP - 34

    JO - IEEE Transactions on Semiconductor Manufacturing

    JF - IEEE Transactions on Semiconductor Manufacturing

    SN - 0894-6507

    IS - 1

    ER -