TY - JOUR
T1 - Novel roll-to-roll lift-off patterned active-matrix display on flexible polymer substrate
AU - Lo, Cheng-Yao
AU - Hiitola-Keinänen, Johanna
AU - Huttunen, Olli-Heikki
AU - Petäjä, Jarno
AU - Hast, Jukka
AU - Maaninen, Arto
AU - Kopola, Harri
AU - Fujita, Hiroyuki
AU - Toshiyoshi, Hiroshi
PY - 2009
Y1 - 2009
N2 - A novel electrode patterning technique by using lift-off a sacrificial black ink layer on thin polymer substrate was performed on a roll-to-roll (reel-to-reel, R2R) printing system. An active-matrix display array was demonstrated by this technique with 2000 µm display pixels with concept of MEMS (micro electro mechanical system) etalon. The resolution of this flexography lift-off system was improved to 100 µm for pattern isolation from gravure printing. Compare to well-developed hot embossing or laser ablation for polymer substrate’s patterning, R2R lift-off provides a flat and smooth surface which is a must for multilayer stacking and reliability. This system also provides a high pattern integrity, low cost, large scale, and high throughput solution for electrode patterning on flexible polymer substrate.
AB - A novel electrode patterning technique by using lift-off a sacrificial black ink layer on thin polymer substrate was performed on a roll-to-roll (reel-to-reel, R2R) printing system. An active-matrix display array was demonstrated by this technique with 2000 µm display pixels with concept of MEMS (micro electro mechanical system) etalon. The resolution of this flexography lift-off system was improved to 100 µm for pattern isolation from gravure printing. Compare to well-developed hot embossing or laser ablation for polymer substrate’s patterning, R2R lift-off provides a flat and smooth surface which is a must for multilayer stacking and reliability. This system also provides a high pattern integrity, low cost, large scale, and high throughput solution for electrode patterning on flexible polymer substrate.
KW - Fabry-Perot
KW - Flexible display
KW - MEMS
KW - Roll-to-roll
U2 - 10.1016/j.mee.2009.02.001
DO - 10.1016/j.mee.2009.02.001
M3 - Article
SN - 0167-9317
VL - 86
SP - 979
EP - 983
JO - Microelectronic Engineering
JF - Microelectronic Engineering
IS - 4-6
ER -