Abstract
A new method is introduced for fabricating metal
electrodes for thin film field-effect transistors having a source to
drain distance in the sub-100 nm range. The method is based on a liftoff
process with sidewall spacers and it is demonstrated by fabricating
sub-100 nm polymer transistors. These are to the authors' knowledge the
smallest polymer transistors reported.
Original language | English |
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Pages (from-to) | 713-714 |
Journal | Electronics Letters |
Volume | 29 |
Issue number | 8 |
DOIs | |
Publication status | Published - 1993 |
MoE publication type | A1 Journal article-refereed |