Abstract
A new method is introduced for fabricating metal
electrodes for thin film field-effect transistors having a source to
drain distance in the sub-100 nm range. The method is based on a liftoff
process with sidewall spacers and it is demonstrated by fabricating
sub-100 nm polymer transistors. These are to the authors' knowledge the
smallest polymer transistors reported.
| Original language | English |
|---|---|
| Pages (from-to) | 713-714 |
| Journal | Electronics Letters |
| Volume | 29 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - 1993 |
| MoE publication type | A1 Journal article-refereed |