Novel thermoplastic polymers with improved release properties for thermal NIL

H. Atasoy; M. Vogler; Tomi Haatainen; A. Schleunitz; D. Jarzabek; H. Schift; F. Reuther; G. Gruetzner; Z. Rymuza

doi:10.1016/j.mee.2011.01.080

Novel thermoplastic polymers with improved release properties for thermal NIL

H. Atasoy (Corresponding Author), M. Vogler, Tomi Haatainen, A. Schleunitz, D. Jarzabek, H. Schift, F. Reuther, G. Gruetzner, Z. Rymuza

Research output: Contribution to journal › Article › Scientific › peer-review

14 Citations (Scopus)

Abstract

In the nanoimprint lithography (NIL) process the mould release is a limiting step. Regardless of the carefully designed special properties a resist may have, it has to come over this challenging process step to be employed in a NIL process. Generally, the moulds are coated with anti-sticking layers. Here, an alternative solution is developed by modification of two well-established NIL polymers through integration of fluorinated additives in their formulation. An effective additive concentration window was successfully defined, in which the substrate adhesion and imprint behaviour is not influenced. Defect-free patterning down to 30 nm is possible. A release force reduction of about 40% was observed with the modified polymer mr-I 7000R compared to the unmodified original.

Original language	English
Pages (from-to)	1902-1905
Number of pages	4
Journal	Microelectronic Engineering
Volume	88
Issue number	8
DOIs	https://doi.org/10.1016/j.mee.2011.01.080
Publication status	Published - 2011
MoE publication type	A1 Journal article-refereed
Event	36th International Conference on Micro- and Nano-Engineering, MNE 2010 - Genoa, Italy Duration: 19 Sept 2010 → 22 Sept 2010

Keywords

NIL polymers
fluorinated additives
release forces

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10.1016/j.mee.2011.01.080

Cite this

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title = "Novel thermoplastic polymers with improved release properties for thermal NIL",

abstract = "In the nanoimprint lithography (NIL) process the mould release is a limiting step. Regardless of the carefully designed special properties a resist may have, it has to come over this challenging process step to be employed in a NIL process. Generally, the moulds are coated with anti-sticking layers. Here, an alternative solution is developed by modification of two well-established NIL polymers through integration of fluorinated additives in their formulation. An effective additive concentration window was successfully defined, in which the substrate adhesion and imprint behaviour is not influenced. Defect-free patterning down to 30 nm is possible. A release force reduction of about 40% was observed with the modified polymer mr-I 7000R compared to the unmodified original.",

keywords = "NIL polymers, fluorinated additives, release forces",

author = "H. Atasoy and M. Vogler and Tomi Haatainen and A. Schleunitz and D. Jarzabek and H. Schift and F. Reuther and G. Gruetzner and Z. Rymuza",

year = "2011",

doi = "10.1016/j.mee.2011.01.080",

language = "English",

volume = "88",

pages = "1902--1905",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "8",

note = "36th International Conference on Micro- and Nano-Engineering, MNE 2010, MNE 2010 ; Conference date: 19-09-2010 Through 22-09-2010",

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TY - JOUR

T1 - Novel thermoplastic polymers with improved release properties for thermal NIL

AU - Atasoy, H.

AU - Vogler, M.

AU - Haatainen, Tomi

AU - Schleunitz, A.

AU - Jarzabek, D.

AU - Schift, H.

AU - Reuther, F.

AU - Gruetzner, G.

AU - Rymuza, Z.

PY - 2011

Y1 - 2011

N2 - In the nanoimprint lithography (NIL) process the mould release is a limiting step. Regardless of the carefully designed special properties a resist may have, it has to come over this challenging process step to be employed in a NIL process. Generally, the moulds are coated with anti-sticking layers. Here, an alternative solution is developed by modification of two well-established NIL polymers through integration of fluorinated additives in their formulation. An effective additive concentration window was successfully defined, in which the substrate adhesion and imprint behaviour is not influenced. Defect-free patterning down to 30 nm is possible. A release force reduction of about 40% was observed with the modified polymer mr-I 7000R compared to the unmodified original.

AB - In the nanoimprint lithography (NIL) process the mould release is a limiting step. Regardless of the carefully designed special properties a resist may have, it has to come over this challenging process step to be employed in a NIL process. Generally, the moulds are coated with anti-sticking layers. Here, an alternative solution is developed by modification of two well-established NIL polymers through integration of fluorinated additives in their formulation. An effective additive concentration window was successfully defined, in which the substrate adhesion and imprint behaviour is not influenced. Defect-free patterning down to 30 nm is possible. A release force reduction of about 40% was observed with the modified polymer mr-I 7000R compared to the unmodified original.

KW - NIL polymers

KW - fluorinated additives

KW - release forces

U2 - 10.1016/j.mee.2011.01.080

DO - 10.1016/j.mee.2011.01.080

M3 - Article

SN - 0167-9317

VL - 88

SP - 1902

EP - 1905

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 8

T2 - 36th International Conference on Micro- and Nano-Engineering, MNE 2010

Y2 - 19 September 2010 through 22 September 2010

ER -

Novel thermoplastic polymers with improved release properties for thermal NIL

Abstract

Keywords

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