Optical determination of the film thicknesses in multilayer thin film structures

Markku Ylilammi, Timo Ranta-aho

    Research output: Contribution to journalArticleScientificpeer-review

    246 Citations (Scopus)


    An optical method for determining the layer thicknesses in a multilayer thin film structure is developed and its performance in terms of accuracy and resolving power is characterized. The effects of layer thicknesses, their indices of refraction, light absorption, measurement wavelength range, thickness non-uniformity and unintentional transition layers are characterized. The measurement procedure is applied to oxide, sulphide and fluoride thin film multilayer structures, up to nine individual layers thick, deposited on a glass substrate using atomic layer deposition. In most cases the method is found reliable and error estimates of film thickness vary between 1 and 50 nm depending on the thin film structure in the sample.

    Original languageEnglish
    Pages (from-to)56-62
    Number of pages7
    JournalThin Solid Films
    Issue number1
    Publication statusPublished - 1993
    MoE publication typeA1 Journal article-refereed


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