Optical determination of the film thicknesses in multilayer thin film structures

Markku Ylilammi, Timo Ranta-aho

    Research output: Contribution to journalArticleScientificpeer-review

    237 Citations (Scopus)

    Abstract

    An optical method for determining the layer thicknesses in a multilayer thin film structure is developed and its performance in terms of accuracy and resolving power is characterized. The effects of layer thicknesses, their indices of refraction, light absorption, measurement wavelength range, thickness non-uniformity and unintentional transition layers are characterized. The measurement procedure is applied to oxide, sulphide and fluoride thin film multilayer structures, up to nine individual layers thick, deposited on a glass substrate using atomic layer deposition. In most cases the method is found reliable and error estimates of film thickness vary between 1 and 50 nm depending on the thin film structure in the sample.

    Original languageEnglish
    Pages (from-to)56-62
    Number of pages7
    JournalThin Solid Films
    Volume232
    Issue number1
    DOIs
    Publication statusPublished - 1993
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Multilayer films
    Film thickness
    film thickness
    Thin films
    thin films
    transition layers
    Atomic layer deposition
    Optical resolving power
    Sulfides
    atomic layer epitaxy
    electromagnetic absorption
    Refraction
    Fluorides
    nonuniformity
    Oxides
    Light absorption
    laminates
    fluorides
    sulfides
    refraction

    Cite this

    Ylilammi, Markku ; Ranta-aho, Timo. / Optical determination of the film thicknesses in multilayer thin film structures. In: Thin Solid Films. 1993 ; Vol. 232, No. 1. pp. 56-62.
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    Optical determination of the film thicknesses in multilayer thin film structures. / Ylilammi, Markku; Ranta-aho, Timo.

    In: Thin Solid Films, Vol. 232, No. 1, 1993, p. 56-62.

    Research output: Contribution to journalArticleScientificpeer-review

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    T1 - Optical determination of the film thicknesses in multilayer thin film structures

    AU - Ylilammi, Markku

    AU - Ranta-aho, Timo

    N1 - Project code: PUO3003

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    AB - An optical method for determining the layer thicknesses in a multilayer thin film structure is developed and its performance in terms of accuracy and resolving power is characterized. The effects of layer thicknesses, their indices of refraction, light absorption, measurement wavelength range, thickness non-uniformity and unintentional transition layers are characterized. The measurement procedure is applied to oxide, sulphide and fluoride thin film multilayer structures, up to nine individual layers thick, deposited on a glass substrate using atomic layer deposition. In most cases the method is found reliable and error estimates of film thickness vary between 1 and 50 nm depending on the thin film structure in the sample.

    U2 - 10.1016/0040-6090(93)90762-E

    DO - 10.1016/0040-6090(93)90762-E

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