Optical properties of atomic layer deposited materials and their application in silicon waveguides

T. Alasaarela; Jussi Hiltunen; A. Khanna; A. Säynätjoki; A. Tervonen; S. Honkanen

doi:10.1117/12.841524

Optical properties of atomic layer deposited materials and their application in silicon waveguides

T. Alasaarela, Jussi Hiltunen, A. Khanna, A. Säynätjoki, A. Tervonen, S. Honkanen

BA14 Sensing and integration

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Abstract

Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes.
Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications.
Experimental coating of silicon waveguides is discussed.

Original language	English
Title of host publication	Proceedings of SPIE
Subtitle of host publication	Optical Components and Materials VII
Publisher	International Society for Optics and Photonics SPIE
ISBN (Print)	978-0-8194-7994-5
DOIs	https://doi.org/10.1117/12.841524
Publication status	Published - 2010
MoE publication type	A4 Article in a conference publication
Event	Optical Components and Materials VII - San Francisco, CA, United States Duration: 26 Jan 2010 → 28 Jan 2010

Publication series

Series	Proceedings of SPIE
Volume	7598
ISSN	0277-786X

Conference

Conference	Optical Components and Materials VII
Country	United States
City	San Francisco, CA
Period	26/01/10 → 28/01/10

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Keywords

atomic layer deposition
ALD
silicon photonics
optical waveguides
silicon waveguides
waveguide

Cite this

Alasaarela, T., Hiltunen, J., Khanna, A., Säynätjoki, A., Tervonen, A., & Honkanen, S. (2010). Optical properties of atomic layer deposited materials and their application in silicon waveguides. In Proceedings of SPIE : Optical Components and Materials VII [75980D] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 7598 https://doi.org/10.1117/12.841524

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abstract = "Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.",

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author = "T. Alasaarela and Jussi Hiltunen and A. Khanna and A. S{\"a}yn{\"a}tjoki and A. Tervonen and S. Honkanen",

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Alasaarela, T, Hiltunen, J, Khanna, A, Säynätjoki, A, Tervonen, A & Honkanen, S 2010, Optical properties of atomic layer deposited materials and their application in silicon waveguides. in Proceedings of SPIE : Optical Components and Materials VII., 75980D, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 7598, Optical Components and Materials VII, San Francisco, CA, United States, 26/01/10. https://doi.org/10.1117/12.841524

Optical properties of atomic layer deposited materials and their application in silicon waveguides. / Alasaarela, T.; Hiltunen, Jussi; Khanna, A.; Säynätjoki, A.; Tervonen, A.; Honkanen, S.

Proceedings of SPIE : Optical Components and Materials VII. International Society for Optics and Photonics SPIE, 2010. 75980D (Proceedings of SPIE, Vol. 7598).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

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T1 - Optical properties of atomic layer deposited materials and their application in silicon waveguides

AU - Alasaarela, T.

AU - Hiltunen, Jussi

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AU - Säynätjoki, A.

AU - Tervonen, A.

AU - Honkanen, S.

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AB - Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.

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KW - ALD

KW - silicon photonics

KW - optical waveguides

KW - silicon waveguides

KW - waveguide

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M3 - Conference article in proceedings

SN - 978-0-8194-7994-5

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Alasaarela T, Hiltunen J, Khanna A, Säynätjoki A, Tervonen A, Honkanen S. Optical properties of atomic layer deposited materials and their application in silicon waveguides. In Proceedings of SPIE : Optical Components and Materials VII. International Society for Optics and Photonics SPIE. 2010. 75980D. (Proceedings of SPIE, Vol. 7598). https://doi.org/10.1117/12.841524

Access to Document

10.1117/12.841524