Optical properties of atomic layer deposited materials and their application in silicon waveguides

T. Alasaarela, Jussi Hiltunen, A. Khanna, A. Säynätjoki, A. Tervonen, S. Honkanen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review


    Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes.
    Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications.
    Experimental coating of silicon waveguides is discussed.
    Original languageEnglish
    Title of host publicationProceedings of SPIE
    Subtitle of host publicationOptical Components and Materials VII
    PublisherInternational Society for Optics and Photonics SPIE
    ISBN (Print)978-0-8194-7994-5
    Publication statusPublished - 2010
    MoE publication typeA4 Article in a conference publication
    EventOptical Components and Materials VII - San Francisco, CA, United States
    Duration: 26 Jan 201028 Jan 2010

    Publication series

    SeriesProceedings of SPIE


    ConferenceOptical Components and Materials VII
    Country/TerritoryUnited States
    CitySan Francisco, CA


    • atomic layer deposition
    • ALD
    • silicon photonics
    • optical waveguides
    • silicon waveguides
    • waveguide


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