Abstract
Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes.
Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications.
Experimental coating of silicon waveguides is discussed.
Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications.
Experimental coating of silicon waveguides is discussed.
Original language | English |
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Title of host publication | Proceedings of SPIE |
Subtitle of host publication | Optical Components and Materials VII |
Publisher | International Society for Optics and Photonics SPIE |
ISBN (Print) | 978-0-8194-7994-5 |
DOIs | |
Publication status | Published - 2010 |
MoE publication type | A4 Article in a conference publication |
Event | Optical Components and Materials VII - San Francisco, CA, United States Duration: 26 Jan 2010 → 28 Jan 2010 |
Publication series
Series | Proceedings of SPIE |
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Volume | 7598 |
ISSN | 0277-786X |
Conference
Conference | Optical Components and Materials VII |
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Country/Territory | United States |
City | San Francisco, CA |
Period | 26/01/10 → 28/01/10 |
Keywords
- atomic layer deposition
- ALD
- silicon photonics
- optical waveguides
- silicon waveguides
- waveguide