Abstract
Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications.
Experimental coating of silicon waveguides is discussed.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of SPIE |
| Subtitle of host publication | Optical Components and Materials VII |
| Publisher | International Society for Optics and Photonics SPIE |
| ISBN (Print) | 978-0-8194-7994-5 |
| DOIs | |
| Publication status | Published - 2010 |
| MoE publication type | A4 Article in a conference publication |
| Event | Optical Components and Materials VII - San Francisco, CA, United States Duration: 26 Jan 2010 → 28 Jan 2010 |
Publication series
| Series | Proceedings of SPIE |
|---|---|
| Volume | 7598 |
| ISSN | 0277-786X |
Conference
| Conference | Optical Components and Materials VII |
|---|---|
| Country | United States |
| City | San Francisco, CA |
| Period | 26/01/10 → 28/01/10 |
Fingerprint
Keywords
- atomic layer deposition
- ALD
- silicon photonics
- optical waveguides
- silicon waveguides
- waveguide
Cite this
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Optical properties of atomic layer deposited materials and their application in silicon waveguides. / Alasaarela, T.; Hiltunen, Jussi; Khanna, A.; Säynätjoki, A.; Tervonen, A.; Honkanen, S.
Proceedings of SPIE : Optical Components and Materials VII. International Society for Optics and Photonics SPIE, 2010. 75980D (Proceedings of SPIE, Vol. 7598).Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review
TY - GEN
T1 - Optical properties of atomic layer deposited materials and their application in silicon waveguides
AU - Alasaarela, T.
AU - Hiltunen, Jussi
AU - Khanna, A.
AU - Säynätjoki, A.
AU - Tervonen, A.
AU - Honkanen, S.
PY - 2010
Y1 - 2010
N2 - Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.
AB - Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.
KW - atomic layer deposition
KW - ALD
KW - silicon photonics
KW - optical waveguides
KW - silicon waveguides
KW - waveguide
U2 - 10.1117/12.841524
DO - 10.1117/12.841524
M3 - Conference article in proceedings
SN - 978-0-8194-7994-5
T3 - Proceedings of SPIE
BT - Proceedings of SPIE
PB - International Society for Optics and Photonics SPIE
ER -