Optical properties of atomic layer deposited materials and their application in silicon waveguides

T. Alasaarela; Jussi Hiltunen; A. Khanna; A. Säynätjoki; A. Tervonen; S. Honkanen

doi:10.1117/12.841524

Optical properties of atomic layer deposited materials and their application in silicon waveguides

T. Alasaarela, Jussi Hiltunen, A. Khanna, A. Säynätjoki, A. Tervonen, S. Honkanen

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Abstract

Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes.
Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications.
Experimental coating of silicon waveguides is discussed.

Original language	English
Title of host publication	Proceedings of SPIE
Subtitle of host publication	Optical Components and Materials VII
Publisher	International Society for Optics and Photonics SPIE
ISBN (Print)	978-0-8194-7994-5
DOIs	https://doi.org/10.1117/12.841524
Publication status	Published - 2010
MoE publication type	A4 Article in a conference publication
Event	Optical Components and Materials VII - San Francisco, CA, United States Duration: 26 Jan 2010 → 28 Jan 2010

Publication series

Series	Proceedings of SPIE
Volume	7598
ISSN	0277-786X

Conference

Conference	Optical Components and Materials VII
Country/Territory	United States
City	San Francisco, CA
Period	26/01/10 → 28/01/10

Keywords

atomic layer deposition
ALD
silicon photonics
optical waveguides
silicon waveguides
waveguide

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10.1117/12.841524

Cite this

Alasaarela, T., Hiltunen, J., Khanna, A., Säynätjoki, A., Tervonen, A., & Honkanen, S. (2010). Optical properties of atomic layer deposited materials and their application in silicon waveguides. In Proceedings of SPIE : Optical Components and Materials VII [75980D] International Society for Optics and Photonics SPIE. Proceedings of SPIE Vol. 7598 https://doi.org/10.1117/12.841524

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title = "Optical properties of atomic layer deposited materials and their application in silicon waveguides",

abstract = "Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.",

keywords = "atomic layer deposition, ALD, silicon photonics, optical waveguides, silicon waveguides, waveguide",

author = "T. Alasaarela and Jussi Hiltunen and A. Khanna and A. S{\"a}yn{\"a}tjoki and A. Tervonen and S. Honkanen",

year = "2010",

doi = "10.1117/12.841524",

language = "English",

isbn = "978-0-8194-7994-5",

series = "Proceedings of SPIE",

publisher = "International Society for Optics and Photonics SPIE",

booktitle = "Proceedings of SPIE",

address = "United States",

note = "Optical Components and Materials VII ; Conference date: 26-01-2010 Through 28-01-2010",

}

Alasaarela, T, Hiltunen, J, Khanna, A, Säynätjoki, A, Tervonen, A & Honkanen, S 2010, Optical properties of atomic layer deposited materials and their application in silicon waveguides. in Proceedings of SPIE : Optical Components and Materials VII., 75980D, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 7598, Optical Components and Materials VII, San Francisco, CA, United States, 26/01/10. https://doi.org/10.1117/12.841524

Optical properties of atomic layer deposited materials and their application in silicon waveguides. / Alasaarela, T.; Hiltunen, Jussi; Khanna, A.; Säynätjoki, A.; Tervonen, A.; Honkanen, S.

Proceedings of SPIE : Optical Components and Materials VII. International Society for Optics and Photonics SPIE, 2010. 75980D (Proceedings of SPIE, Vol. 7598).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Optical properties of atomic layer deposited materials and their application in silicon waveguides

AU - Alasaarela, T.

AU - Hiltunen, Jussi

AU - Khanna, A.

AU - Säynätjoki, A.

AU - Tervonen, A.

AU - Honkanen, S.

PY - 2010

Y1 - 2010

N2 - Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.

AB - Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.

KW - atomic layer deposition

KW - ALD

KW - silicon photonics

KW - optical waveguides

KW - silicon waveguides

KW - waveguide

U2 - 10.1117/12.841524

DO - 10.1117/12.841524

M3 - Conference article in proceedings

SN - 978-0-8194-7994-5

T3 - Proceedings of SPIE

BT - Proceedings of SPIE

PB - International Society for Optics and Photonics SPIE

T2 - Optical Components and Materials VII

Y2 - 26 January 2010 through 28 January 2010

ER -

Alasaarela T, Hiltunen J, Khanna A, Säynätjoki A, Tervonen A, Honkanen S. Optical properties of atomic layer deposited materials and their application in silicon waveguides. In Proceedings of SPIE : Optical Components and Materials VII. International Society for Optics and Photonics SPIE. 2010. 75980D. (Proceedings of SPIE, Vol. 7598). https://doi.org/10.1117/12.841524

Optical properties of atomic layer deposited materials and their application in silicon waveguides

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