Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties

Masoud Rastgou; Aleksandr Danilenko; Juha Peltoniemi; Farshid Manoocheri; Erkki Ikonen

doi:10.1088/1361-6501/ade329

Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties

Masoud Rastgou^*
, Aleksandr Danilenko
, Juha Peltoniemi
, Farshid Manoocheri
, Erkki Ikonen

^*Corresponding author for this work

SU12 VTT MIKES

Research output: Contribution to journal › Article › Scientific › peer-review

1 Citation (Scopus)

Abstract

Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO₂ on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.

Original language	English
Article number	075001
Journal	Measurement Science and Technology
Volume	36
Issue number	7
DOIs	https://doi.org/10.1088/1361-6501/ade329
Publication status	Published - 31 Jul 2025
MoE publication type	A1 Journal article-refereed

Funding

We thank Emmanuel Nolot from the French Alternative Energies and Atomic Energy Commission (CEA) for the preparation of SiO2 on Si samples. The Project 20IND04 ATMOC leading to this publication has received funding from the EURAMET EMPIR program co-financed by the participating states and the European Union’s Horizon 2020 research and innovation program. The work is part of the Research Council of Finland Flagship Programme, Photonics Research and Innovation (PREIN), Decision Number 346529, Aalto University.

Keywords

angle of incidence
bandwidth
micro-reflectometer
thin film thickness

Access to Document

10.1088/1361-6501/ade329Licence: CC BY

Cite this

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title = "Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties",

abstract = "Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO2 on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.",

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AU - Danilenko, Aleksandr

AU - Peltoniemi, Juha

AU - Manoocheri, Farshid

AU - Ikonen, Erkki

PY - 2025/7/31

Y1 - 2025/7/31

N2 - Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO2 on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.

AB - Accurate characterization of thin film optical properties is important for the electronics and photonics industries. This paper focuses on optimizing measurement accuracy for microscope-based reflectometers with an on-axis incident beam. Key factors analyzed include the distribution of angles of incidence in microscope geometry, spectrometer bandwidth correction, and sample thickness variations. We develop a reflectance model incorporating these factors, improving fit quality essential for reliable uncertainty analysis. Validation measurements with SiO2 on Si layers (10-2000 nm) using a working standard gonio-reflectometer show consistent thickness values with the microscope-based reflectometer, confirming the reliability of the approach.

KW - angle of incidence

KW - bandwidth

KW - micro-reflectometer

KW - thin film thickness

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JO - Measurement Science and Technology

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Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties

Abstract

Funding

Keywords

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EMPIR: European Metrology Programme for Innovation and Research (EMPIR)

Cite this

Optimizing measurement accuracy in microscope-based reflectometry for thin film optical properties

Abstract

Funding

Keywords

Access to Document

Other files and links

Fingerprint

Projects

EMPIR: European Metrology Programme for Innovation and Research (EMPIR)

Cite this