Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator

Jarno Kaakkunen, Martti Silvennoinen, Kimmo Päiväsaaari, Petri Laakso, Pasi Vahimaa

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

1 Citation (Scopus)

Abstract

Due to technical development of the adaptive optics, use of them in various laser processing applications has become possible. These techniques based on the adaptive optics have been applied with various lasers to generate diffraction patterns with equal intensity spots. In this paper ultrashort laser pulse ablation with intensity modulated diffraction pattern is presented. Diffraction patterns are generated with the Computer Generated Holograms (CGH) created using the Spatial Light Modulator (SLM). Applied CGHs are designed using method based on the Iterative Fourier Transform Algorithm (IFTA). Added to this Fresnel lenses are used to avoid problems with 0th-diffraction order. With this kind of designing procedure it is possible to generate diffraction patterns with intensity variation between diffracted spots. By intensity modulating the diffracted beams it is possible to ablate virtually arbitrary patterns with depth variation into the different materials. In this paper different kinds of CGHs are designed to generate various diffraction patterns with intensity modulation. These patterns are used to ablate greyscale images directly into the silicon using ultrashort pulses.
Original languageEnglish
Title of host publicationProceedings of ICALEO 2013
Place of PublicationOrlando, Fla. USA
PublisherLaser Institute of America
Pages672-676
ISBN (Print)978-0-9120-3598-7
Publication statusPublished - 2013
MoE publication typeNot Eligible
Event32nd International Congress on Applications of Lasers & Electro-Optics, ICALEO - Miami, United States
Duration: 6 Oct 201310 Oct 2013
Conference number: 32

Conference

Conference32nd International Congress on Applications of Lasers & Electro-Optics, ICALEO
CountryUnited States
CityMiami
Period6/10/1310/10/13

Fingerprint

light modulators
diffraction patterns
lasers
adaptive optics
Fresnel lenses
pulses
ablation
modulation
silicon
diffraction

Keywords

  • femtosecond laser
  • spatial light modulator
  • computer generated hologram
  • laser marking
  • microstructures

Cite this

Kaakkunen, J., Silvennoinen, M., Päiväsaaari, K., Laakso, P., & Vahimaa, P. (2013). Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator. In Proceedings of ICALEO 2013 (pp. 672-676). Orlando, Fla. USA: Laser Institute of America.
Kaakkunen, Jarno ; Silvennoinen, Martti ; Päiväsaaari, Kimmo ; Laakso, Petri ; Vahimaa, Pasi. / Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator. Proceedings of ICALEO 2013. Orlando, Fla. USA : Laser Institute of America, 2013. pp. 672-676
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abstract = "Due to technical development of the adaptive optics, use of them in various laser processing applications has become possible. These techniques based on the adaptive optics have been applied with various lasers to generate diffraction patterns with equal intensity spots. In this paper ultrashort laser pulse ablation with intensity modulated diffraction pattern is presented. Diffraction patterns are generated with the Computer Generated Holograms (CGH) created using the Spatial Light Modulator (SLM). Applied CGHs are designed using method based on the Iterative Fourier Transform Algorithm (IFTA). Added to this Fresnel lenses are used to avoid problems with 0th-diffraction order. With this kind of designing procedure it is possible to generate diffraction patterns with intensity variation between diffracted spots. By intensity modulating the diffracted beams it is possible to ablate virtually arbitrary patterns with depth variation into the different materials. In this paper different kinds of CGHs are designed to generate various diffraction patterns with intensity modulation. These patterns are used to ablate greyscale images directly into the silicon using ultrashort pulses.",
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author = "Jarno Kaakkunen and Martti Silvennoinen and Kimmo P{\"a}iv{\"a}saaari and Petri Laakso and Pasi Vahimaa",
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Kaakkunen, J, Silvennoinen, M, Päiväsaaari, K, Laakso, P & Vahimaa, P 2013, Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator. in Proceedings of ICALEO 2013. Laser Institute of America, Orlando, Fla. USA, pp. 672-676, 32nd International Congress on Applications of Lasers & Electro-Optics, ICALEO, Miami, United States, 6/10/13.

Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator. / Kaakkunen, Jarno; Silvennoinen, Martti; Päiväsaaari, Kimmo; Laakso, Petri; Vahimaa, Pasi.

Proceedings of ICALEO 2013. Orlando, Fla. USA : Laser Institute of America, 2013. p. 672-676.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

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T1 - Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator

AU - Kaakkunen, Jarno

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AU - Päiväsaaari, Kimmo

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AU - Vahimaa, Pasi

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N2 - Due to technical development of the adaptive optics, use of them in various laser processing applications has become possible. These techniques based on the adaptive optics have been applied with various lasers to generate diffraction patterns with equal intensity spots. In this paper ultrashort laser pulse ablation with intensity modulated diffraction pattern is presented. Diffraction patterns are generated with the Computer Generated Holograms (CGH) created using the Spatial Light Modulator (SLM). Applied CGHs are designed using method based on the Iterative Fourier Transform Algorithm (IFTA). Added to this Fresnel lenses are used to avoid problems with 0th-diffraction order. With this kind of designing procedure it is possible to generate diffraction patterns with intensity variation between diffracted spots. By intensity modulating the diffracted beams it is possible to ablate virtually arbitrary patterns with depth variation into the different materials. In this paper different kinds of CGHs are designed to generate various diffraction patterns with intensity modulation. These patterns are used to ablate greyscale images directly into the silicon using ultrashort pulses.

AB - Due to technical development of the adaptive optics, use of them in various laser processing applications has become possible. These techniques based on the adaptive optics have been applied with various lasers to generate diffraction patterns with equal intensity spots. In this paper ultrashort laser pulse ablation with intensity modulated diffraction pattern is presented. Diffraction patterns are generated with the Computer Generated Holograms (CGH) created using the Spatial Light Modulator (SLM). Applied CGHs are designed using method based on the Iterative Fourier Transform Algorithm (IFTA). Added to this Fresnel lenses are used to avoid problems with 0th-diffraction order. With this kind of designing procedure it is possible to generate diffraction patterns with intensity variation between diffracted spots. By intensity modulating the diffracted beams it is possible to ablate virtually arbitrary patterns with depth variation into the different materials. In this paper different kinds of CGHs are designed to generate various diffraction patterns with intensity modulation. These patterns are used to ablate greyscale images directly into the silicon using ultrashort pulses.

KW - femtosecond laser

KW - spatial light modulator

KW - computer generated hologram

KW - laser marking

KW - microstructures

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Kaakkunen J, Silvennoinen M, Päiväsaaari K, Laakso P, Vahimaa P. Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator. In Proceedings of ICALEO 2013. Orlando, Fla. USA: Laser Institute of America. 2013. p. 672-676