Pattern definition by nanoimprint lithography and dry etching

H. Schultz, T. Hoffmann, H.-C. Scheer, C. Sotomayor-Torres, Karl Pfeiffer, G. Bleidiessel, G. Grutzner, Jouni Ahopelto, F. Gaboriau, M.-C. Peignon, C. Cardinaud

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Original languageEnglish
Pages46-47
Publication statusPublished - 1999
MoE publication typeNot Eligible
EventSilicon Nanoelectronics Workshop, SNW 1999 - Kyoto, Japan
Duration: 12 Jun 199913 Jun 1999

Conference

ConferenceSilicon Nanoelectronics Workshop, SNW 1999
CountryJapan
CityKyoto
Period12/06/9913/06/99

Cite this

Schultz, H., Hoffmann, T., Scheer, H-C., Sotomayor-Torres, C., Pfeiffer, K., Bleidiessel, G., Grutzner, G., Ahopelto, J., Gaboriau, F., Peignon, M-C., & Cardinaud, C. (1999). Pattern definition by nanoimprint lithography and dry etching. 46-47. Abstract from Silicon Nanoelectronics Workshop, SNW 1999, Kyoto, Japan.