Pattern definition by nanoimprint lithography and dry etching

H. Schultz, T. Hoffmann, H.-C. Scheer, C. Sotomayor-Torres, Karl Pfeiffer, G. Bleidiessel, G. Grutzner, Jouni Ahopelto, F. Gaboriau, M.-C. Peignon, C. Cardinaud

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Original languageEnglish
Pages46-47
Publication statusPublished - 1999
MoE publication typeNot Eligible
EventSilicon Nanoelectronics Workshop, SNW 1999 - Kyoto, Japan
Duration: 12 Jun 199913 Jun 1999

Conference

ConferenceSilicon Nanoelectronics Workshop, SNW 1999
CountryJapan
CityKyoto
Period12/06/9913/06/99

Cite this

Schultz, H., Hoffmann, T., Scheer, H-C., Sotomayor-Torres, C., Pfeiffer, K., Bleidiessel, G., ... Cardinaud, C. (1999). Pattern definition by nanoimprint lithography and dry etching. 46-47. Abstract from Silicon Nanoelectronics Workshop, SNW 1999, Kyoto, Japan.
Schultz, H. ; Hoffmann, T. ; Scheer, H.-C. ; Sotomayor-Torres, C. ; Pfeiffer, Karl ; Bleidiessel, G. ; Grutzner, G. ; Ahopelto, Jouni ; Gaboriau, F. ; Peignon, M.-C. ; Cardinaud, C. / Pattern definition by nanoimprint lithography and dry etching. Abstract from Silicon Nanoelectronics Workshop, SNW 1999, Kyoto, Japan.
@conference{f218416762ee41249d855a2bd87fe53f,
title = "Pattern definition by nanoimprint lithography and dry etching",
author = "H. Schultz and T. Hoffmann and H.-C. Scheer and C. Sotomayor-Torres and Karl Pfeiffer and G. Bleidiessel and G. Grutzner and Jouni Ahopelto and F. Gaboriau and M.-C. Peignon and C. Cardinaud",
year = "1999",
language = "English",
pages = "46--47",
note = "Silicon Nanoelectronics Workshop, SNW 1999 ; Conference date: 12-06-1999 Through 13-06-1999",

}

Schultz, H, Hoffmann, T, Scheer, H-C, Sotomayor-Torres, C, Pfeiffer, K, Bleidiessel, G, Grutzner, G, Ahopelto, J, Gaboriau, F, Peignon, M-C & Cardinaud, C 1999, 'Pattern definition by nanoimprint lithography and dry etching' Silicon Nanoelectronics Workshop, SNW 1999, Kyoto, Japan, 12/06/99 - 13/06/99, pp. 46-47.

Pattern definition by nanoimprint lithography and dry etching. / Schultz, H.; Hoffmann, T.; Scheer, H.-C.; Sotomayor-Torres, C.; Pfeiffer, Karl; Bleidiessel, G.; Grutzner, G.; Ahopelto, Jouni; Gaboriau, F.; Peignon, M.-C.; Cardinaud, C.

1999. 46-47 Abstract from Silicon Nanoelectronics Workshop, SNW 1999, Kyoto, Japan.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

TY - CONF

T1 - Pattern definition by nanoimprint lithography and dry etching

AU - Schultz, H.

AU - Hoffmann, T.

AU - Scheer, H.-C.

AU - Sotomayor-Torres, C.

AU - Pfeiffer, Karl

AU - Bleidiessel, G.

AU - Grutzner, G.

AU - Ahopelto, Jouni

AU - Gaboriau, F.

AU - Peignon, M.-C.

AU - Cardinaud, C.

PY - 1999

Y1 - 1999

M3 - Conference Abstract

SP - 46

EP - 47

ER -

Schultz H, Hoffmann T, Scheer H-C, Sotomayor-Torres C, Pfeiffer K, Bleidiessel G et al. Pattern definition by nanoimprint lithography and dry etching. 1999. Abstract from Silicon Nanoelectronics Workshop, SNW 1999, Kyoto, Japan.