Pattern definition by nanoimprint lithography and dry etching

H. Schultz; T. Hoffmann; H.-C. Scheer; C. Sotomayor-Torres; Karl Pfeiffer; G. Bleidiessel; G. Grutzner; Jouni Ahopelto; F. Gaboriau; M.-C. Peignon; C. Cardinaud

Pattern definition by nanoimprint lithography and dry etching

H. Schultz
, T. Hoffmann
, H.-C. Scheer
, C. Sotomayor-Torres
, Karl Pfeiffer
, G. Bleidiessel
, G. Grutzner
, Jouni Ahopelto
, F. Gaboriau
, M.-C. Peignon
, C. Cardinaud

VTT Technical Research Centre of Finland

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Pages	46-47
Publication status	Published - 1999
MoE publication type	Not Eligible
Event	Silicon Nanoelectronics Workshop, SNW 1999 - Kyoto, Japan Duration: 12 Jun 1999 → 13 Jun 1999

Conference

Conference	Silicon Nanoelectronics Workshop, SNW 1999
Country/Territory	Japan
City	Kyoto
Period	12/06/99 → 13/06/99

Cite this

@conference{f218416762ee41249d855a2bd87fe53f,

title = "Pattern definition by nanoimprint lithography and dry etching",

author = "H. Schultz and T. Hoffmann and H.-C. Scheer and C. Sotomayor-Torres and Karl Pfeiffer and G. Bleidiessel and G. Grutzner and Jouni Ahopelto and F. Gaboriau and M.-C. Peignon and C. Cardinaud",

year = "1999",

language = "English",

pages = "46--47",

note = "Silicon Nanoelectronics Workshop, SNW 1999 ; Conference date: 12-06-1999 Through 13-06-1999",

}

TY - CONF

T1 - Pattern definition by nanoimprint lithography and dry etching

AU - Schultz, H.

AU - Hoffmann, T.

AU - Scheer, H.-C.

AU - Sotomayor-Torres, C.

AU - Pfeiffer, Karl

AU - Bleidiessel, G.

AU - Grutzner, G.

AU - Ahopelto, Jouni

AU - Gaboriau, F.

AU - Peignon, M.-C.

AU - Cardinaud, C.

PY - 1999

Y1 - 1999

M3 - Conference Abstract

SP - 46

EP - 47

T2 - Silicon Nanoelectronics Workshop, SNW 1999

Y2 - 12 June 1999 through 13 June 1999

ER -