PATTERNS 2010

The Second International Conference on Pervasive Patterns and Applications. November 21-26, 2010 - Lisbon, Portugal

Ali Beklen (Editor), Jorge Ejarque (Editor), Wolfgang Gentzsch (Editor), Teemu Kanstren (Editor), Arne Koschel (Editor), Yong Woo Lee (Editor), Li Li (Editor), Michal Zemlicka (Editor)

Research output: Book/ReportBook (editor)Scientificpeer-review

Original languageEnglish
PublisherInternational Academy, Research, and Industry Association IARIA
Number of pages91
ISBN (Print)978-1-61208-111-3
Publication statusPublished - 2010
MoE publication typeC2 Edited books

Cite this

Beklen, A., Ejarque, J., Gentzsch, W., Kanstren, T., Koschel, A., Lee, Y. W., ... Zemlicka, M. (Eds.) (2010). PATTERNS 2010: The Second International Conference on Pervasive Patterns and Applications. November 21-26, 2010 - Lisbon, Portugal. International Academy, Research, and Industry Association IARIA.
Beklen, Ali (Editor) ; Ejarque, Jorge (Editor) ; Gentzsch, Wolfgang (Editor) ; Kanstren, Teemu (Editor) ; Koschel, Arne (Editor) ; Lee, Yong Woo (Editor) ; Li, Li (Editor) ; Zemlicka, Michal (Editor). / PATTERNS 2010 : The Second International Conference on Pervasive Patterns and Applications. November 21-26, 2010 - Lisbon, Portugal. International Academy, Research, and Industry Association IARIA, 2010. 91 p.
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title = "PATTERNS 2010: The Second International Conference on Pervasive Patterns and Applications. November 21-26, 2010 - Lisbon, Portugal",
editor = "Ali Beklen and Jorge Ejarque and Wolfgang Gentzsch and Teemu Kanstren and Arne Koschel and Lee, {Yong Woo} and Li Li and Michal Zemlicka",
year = "2010",
language = "English",
isbn = "978-1-61208-111-3",
publisher = "International Academy, Research, and Industry Association IARIA",
address = "United States",

}

Beklen, A, Ejarque, J, Gentzsch, W, Kanstren, T, Koschel, A, Lee, YW, Li, L & Zemlicka, M (eds) 2010, PATTERNS 2010: The Second International Conference on Pervasive Patterns and Applications. November 21-26, 2010 - Lisbon, Portugal. International Academy, Research, and Industry Association IARIA.

PATTERNS 2010 : The Second International Conference on Pervasive Patterns and Applications. November 21-26, 2010 - Lisbon, Portugal. / Beklen, Ali (Editor); Ejarque, Jorge (Editor); Gentzsch, Wolfgang (Editor); Kanstren, Teemu (Editor); Koschel, Arne (Editor); Lee, Yong Woo (Editor); Li, Li (Editor); Zemlicka, Michal (Editor).

International Academy, Research, and Industry Association IARIA, 2010. 91 p.

Research output: Book/ReportBook (editor)Scientificpeer-review

TY - BOOK

T1 - PATTERNS 2010

T2 - The Second International Conference on Pervasive Patterns and Applications. November 21-26, 2010 - Lisbon, Portugal

A2 - Beklen, Ali

A2 - Ejarque, Jorge

A2 - Gentzsch, Wolfgang

A2 - Kanstren, Teemu

A2 - Koschel, Arne

A2 - Lee, Yong Woo

A2 - Li, Li

A2 - Zemlicka, Michal

PY - 2010

Y1 - 2010

M3 - Book (editor)

SN - 978-1-61208-111-3

BT - PATTERNS 2010

PB - International Academy, Research, and Industry Association IARIA

ER -

Beklen A, (ed.), Ejarque J, (ed.), Gentzsch W, (ed.), Kanstren T, (ed.), Koschel A, (ed.), Lee YW, (ed.) et al. PATTERNS 2010: The Second International Conference on Pervasive Patterns and Applications. November 21-26, 2010 - Lisbon, Portugal. International Academy, Research, and Industry Association IARIA, 2010. 91 p.