@inproceedings{9c5e883c03b44e0ebd1498d41ff3178f,
title = "Performance enhancement and evaluation of deep dry etching on a production cluster platform",
keywords = "etching, deep dry etching, silicon, MEMS, silicon-on-insulator, SOI, inductively coupled plasma etching, microfluidics",
author = "M. McNie and C. Pickering and A. Rickard and I. Young and {J. Hopkins}, J. and H. Ashraf and S. McAuley and G. Nicholls and R. Barnett and F. Roozeboom and Heuvel, {E. van den} and J. Verhoeven and C. Gormley and P. Schina and {Di Luciano}, C. and Jyrki Kiiham{\"a}ki and A. Kemmeren",
year = "2003",
doi = "10.1117/12.478242",
language = "English",
isbn = "0-8194-4779-X",
series = "Proceedings of SPIE",
publisher = "International Society for Optics and Photonics SPIE",
pages = "34--42",
booktitle = "Micromachining and Microfabrication Process Technology VIII",
address = "United States",
note = "Micromachining and Microfabrication 2003 ; Conference date: 25-01-2003 Through 31-01-2003",
}