Performance enhancement and evaluation of deep dry etching on a production cluster platform

M. McNie, C. Pickering, A. Rickard, I. Young, J. J. Hopkins, H. Ashraf, S. McAuley, G. Nicholls, R. Barnett, F. Roozeboom, E. van den Heuvel, J. Verhoeven, C. Gormley, P. Schina, C. Di Luciano, Jyrki Kiihamäki, A. Kemmeren

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

3 Citations (Scopus)
Original languageEnglish
Title of host publicationMicromachining and Microfabrication Process Technology VIII
PublisherInternational Society for Optics and Photonics SPIE
Pages34-42
ISBN (Print)0-8194-4779-X
DOIs
Publication statusPublished - 2003
MoE publication typeA4 Article in a conference publication
EventMicromachining and Microfabrication 2003 - San Jose, United States
Duration: 25 Jan 200331 Jan 2003

Publication series

SeriesProceedings of SPIE
Volume4979
ISSN0277-786X

Conference

ConferenceMicromachining and Microfabrication 2003
CountryUnited States
CitySan Jose
Period25/01/0331/01/03

Keywords

  • etching
  • deep dry etching
  • silicon
  • MEMS
  • silicon-on-insulator
  • SOI
  • inductively coupled plasma etching
  • microfluidics

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