Performance enhancement and evaluation of deep dry etching on a production cluster platform

M. McNie, C. Pickering, A. Rickard, I. Young, J. J. Hopkins, H. Ashraf, S. McAuley, G. Nicholls, R. Barnett, F. Roozeboom, E. van den Heuvel, J. Verhoeven, C. Gormley, P. Schina, C. Di Luciano, Jyrki Kiihamäki, A. Kemmeren

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    3 Citations (Scopus)
    Original languageEnglish
    Title of host publicationMicromachining and Microfabrication Process Technology VIII
    PublisherInternational Society for Optics and Photonics SPIE
    Pages34-42
    ISBN (Print)0-8194-4779-X
    DOIs
    Publication statusPublished - 2003
    MoE publication typeA4 Article in a conference publication
    EventMicromachining and Microfabrication 2003 - San Jose, United States
    Duration: 25 Jan 200331 Jan 2003

    Publication series

    SeriesProceedings of SPIE
    Volume4979
    ISSN0277-786X

    Conference

    ConferenceMicromachining and Microfabrication 2003
    CountryUnited States
    CitySan Jose
    Period25/01/0331/01/03

    Keywords

    • etching
    • deep dry etching
    • silicon
    • MEMS
    • silicon-on-insulator
    • SOI
    • inductively coupled plasma etching
    • microfluidics

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