Performance enhancement and evaluation of deep dry etching on a production cluster platform

M. McNie; C. Pickering; A. Rickard; I. Young; J. J. Hopkins; H. Ashraf; S. McAuley; G. Nicholls; R. Barnett; F. Roozeboom; E. van den Heuvel; J. Verhoeven; C. Gormley; P. Schina; C. Di Luciano; Jyrki Kiihamäki; A. Kemmeren

doi:10.1117/12.478242

Performance enhancement and evaluation of deep dry etching on a production cluster platform

M. McNie
, C. Pickering
, A. Rickard
, I. Young
, J. J. Hopkins
, H. Ashraf
, S. McAuley
, G. Nicholls
, R. Barnett
, F. Roozeboom
, E. van den Heuvel
, J. Verhoeven
, C. Gormley
, P. Schina
, C. Di Luciano
, Jyrki Kiihamäki
, A. Kemmeren

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

4 Citations (Scopus)

Original language	English
Title of host publication	Micromachining and Microfabrication Process Technology VIII
Publisher	International Society for Optics and Photonics SPIE
Pages	34-42
ISBN (Print)	0-8194-4779-X
DOIs	https://doi.org/10.1117/12.478242
Publication status	Published - 2003
MoE publication type	A4 Article in a conference publication
Event	Micromachining and Microfabrication 2003 - San Jose, United States Duration: 25 Jan 2003 → 31 Jan 2003

Publication series

Series	Proceedings of SPIE
Volume	4979
ISSN	0277-786X

Conference

Conference	Micromachining and Microfabrication 2003
Country/Territory	United States
City	San Jose
Period	25/01/03 → 31/01/03

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

etching
deep dry etching
silicon
MEMS
silicon-on-insulator
SOI
inductively coupled plasma etching
microfluidics

Access to Document

10.1117/12.478242

Cite this

McNie, M., Pickering, C., Rickard, A., Young, I., J. Hopkins, J., Ashraf, H., McAuley, S., Nicholls, G., Barnett, R., Roozeboom, F., Heuvel, E. V. D., Verhoeven, J., Gormley, C., Schina, P., Di Luciano, C., Kiihamäki, J., & Kemmeren, A. (2003). Performance enhancement and evaluation of deep dry etching on a production cluster platform. In Micromachining and Microfabrication Process Technology VIII (pp. 34-42). International Society for Optics and Photonics SPIE. https://doi.org/10.1117/12.478242

@inproceedings{9c5e883c03b44e0ebd1498d41ff3178f,

title = "Performance enhancement and evaluation of deep dry etching on a production cluster platform",

keywords = "etching, deep dry etching, silicon, MEMS, silicon-on-insulator, SOI, inductively coupled plasma etching, microfluidics",

author = "M. McNie and C. Pickering and A. Rickard and I. Young and \{J. Hopkins\}, J. and H. Ashraf and S. McAuley and G. Nicholls and R. Barnett and F. Roozeboom and Heuvel, \{E. van den\} and J. Verhoeven and C. Gormley and P. Schina and \{Di Luciano\}, C. and Jyrki Kiiham{\"a}ki and A. Kemmeren",

year = "2003",

doi = "10.1117/12.478242",

language = "English",

isbn = "0-8194-4779-X",

series = "Proceedings of SPIE",

publisher = "International Society for Optics and Photonics SPIE",

pages = "34--42",

booktitle = "Micromachining and Microfabrication Process Technology VIII",

address = "United States",

note = "Micromachining and Microfabrication 2003 ; Conference date: 25-01-2003 Through 31-01-2003",

}

McNie, M, Pickering, C, Rickard, A, Young, I, J. Hopkins, J, Ashraf, H, McAuley, S, Nicholls, G, Barnett, R, Roozeboom, F, Heuvel, EVD, Verhoeven, J, Gormley, C, Schina, P, Di Luciano, C, Kiihamäki, J & Kemmeren, A 2003, Performance enhancement and evaluation of deep dry etching on a production cluster platform. in Micromachining and Microfabrication Process Technology VIII. International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 4979, pp. 34-42, Micromachining and Microfabrication 2003, San Jose, California, United States, 25/01/03. https://doi.org/10.1117/12.478242

Performance enhancement and evaluation of deep dry etching on a production cluster platform. / McNie, M.; Pickering, C.; Rickard, A. et al.
Micromachining and Microfabrication Process Technology VIII. International Society for Optics and Photonics SPIE, 2003. p. 34-42 (Proceedings of SPIE, Vol. 4979).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Performance enhancement and evaluation of deep dry etching on a production cluster platform

AU - McNie, M.

AU - Pickering, C.

AU - Rickard, A.

AU - Young, I.

AU - J. Hopkins, J.

AU - Ashraf, H.

AU - McAuley, S.

AU - Nicholls, G.

AU - Barnett, R.

AU - Roozeboom, F.

AU - Heuvel, E. van den

AU - Verhoeven, J.

AU - Gormley, C.

AU - Schina, P.

AU - Di Luciano, C.

AU - Kiihamäki, Jyrki

AU - Kemmeren, A.

PY - 2003

Y1 - 2003

KW - etching

KW - deep dry etching

KW - silicon

KW - MEMS

KW - silicon-on-insulator

KW - SOI

KW - inductively coupled plasma etching

KW - microfluidics

U2 - 10.1117/12.478242

DO - 10.1117/12.478242

M3 - Conference article in proceedings

SN - 0-8194-4779-X

T3 - Proceedings of SPIE

SP - 34

EP - 42

BT - Micromachining and Microfabrication Process Technology VIII

PB - International Society for Optics and Photonics SPIE

T2 - Micromachining and Microfabrication 2003

Y2 - 25 January 2003 through 31 January 2003

ER -