Photolithographic fabrication method of computer-generated holographic interferograms

Markus Kajanto, Eero Byckling, Juha Fagerholm, Jussi Heikonen, Jari Turunen, Antti Vasara, Arto Salin

    Research output: Contribution to journalArticle

    5 Citations (Scopus)

    Abstract

    We consider the fabrication of high-quality interferogram-type diffractive optical elements with conventional photolithographic techniques and compare the results with those achievable with electron-beam lithography.
    The fringes associated with the phase transfer function of the binary phase holographic interferogram are approximated with rectangles, which can be realized at submicron accuracy using a pattern generator and step-and-repeat camera.
    The effects of the rectangle quantization are analyzed both numerically and experimentally with the aid of diffraction patterns produced by simple focusing elements.
    Both resolution and diffraction efficiency of the best holograms approach their theoretical values
    Original languageEnglish
    Pages (from-to)778-784
    JournalApplied Optics
    Volume28
    Issue number4
    DOIs
    Publication statusPublished - 1989
    MoE publication typeA1 Journal article-refereed

      Fingerprint

    Cite this

    Kajanto, M., Byckling, E., Fagerholm, J., Heikonen, J., Turunen, J., Vasara, A., & Salin, A. (1989). Photolithographic fabrication method of computer-generated holographic interferograms. Applied Optics, 28(4), 778-784. https://doi.org/10.1364/AO.28.000778